Patents by Inventor Elizabeth G. Pavel

Elizabeth G. Pavel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
    Patent number: 7648916
    Abstract: Methods for monitoring and detecting optical emissions while performing photoresist stripping and removal of residues from a substrate or a film stack on a substrate are provided herein. In one embodiment, a method is provided that includes positioning a substrate comprising a photoresist layer into a processing chamber; processing the photoresist layer using a multiple step plasma process; and monitoring the plasma for a hydrogen optical emission during the multiple step plasma process; wherein the multiple step plasma process includes removing a bulk of the photoresist layer using a bulk removal step; and switching to an overetch step in response to the monitored hydrogen optical emission.
    Type: Grant
    Filed: August 28, 2006
    Date of Patent: January 19, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Elizabeth G. Pavel, Mark N. Kawaguchi, James S. Papanu
  • Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
    Publication number: 20040195208
    Abstract: A method for monitoring and detecting a hydrogen optical emission while performing photoresist stripping and removal of residues from a substrate or a film stack on a substrate.
    Type: Application
    Filed: February 11, 2004
    Publication date: October 7, 2004
    Inventors: Elizabeth G. Pavel, Mark N. Kawaguchi, James S. Papanu