Patents by Inventor Elizabeth J. Opila

Elizabeth J. Opila has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200199027
    Abstract: An article may include a substrate and a coating system on the substrate. The coating system may include a thermal and/or environmental barrier coating (T/EBC) layer, wherein the T/EBC layer includes a silicate phase including more than one metal cation.
    Type: Application
    Filed: December 20, 2019
    Publication date: June 25, 2020
    Inventors: Adam Lee Chamberlain, Elizabeth J. Opila, Mackenzie J. Ridley
  • Patent number: 6410148
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: June 25, 2002
    Assignees: General Electric Co., United Technologies Corp., The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Nanottam P. Bansal, Elizabeth J. Opila, James L. Smialek, Kang N. Lee, Irene T. Spitsberg, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Patent number: 6387456
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: May 14, 2002
    Assignees: General Electric Company, United Technologies Corporation, The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Narottam P. Bansal, Elizabeth J. Opila, James L. Smialek, Kang N. Lee, Irene T. Spitsberg, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Patent number: 6312763
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: November 6, 2001
    Assignees: United Technologies Corporation, General Electric Co., NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Kang N. Lee, Elizabeth J. Opila, James L. Smialek, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Patent number: 6296941
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: October 2, 2001
    Assignees: General Electric Company, United Technologies Corporation, NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Kang N. Lee, Elizabeth J. Opila, James L. Smialek, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Patent number: 6296942
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumino silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: October 2, 2001
    Assignees: General Electric Company, United Technologies Corporation, NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Robert Alden Miller, Nathan S. Jacobson, James L. Smialek, Elizabeth J. Opila, Kang N. Lee, Bangalore A. Nagaraj, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Patent number: 6284325
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumino silicate.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: September 4, 2001
    Assignees: General Electric Company, United Technologies Corporation, The United States of America as represented by the United States National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Robert Alden Miller, Nathan S. Jacobson, James L. Smialek, Elizabeth J. Opila, Kang N. Lee, Bangalore A. Nagaraj, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra