Abstract: Embodiments of the present application relates to cosmetic compositions and cosmetic products free or substantially free of synthetic silicones. The cosmetic composition comprises one or more plant extracts rich in natural silicon (e.g., a bamboo extract), a unique blend of fatty acid esters derived from plant sources and also saccharides derived from plants.

Abstract: A cleaning composition is disclosed for cleaning residue and/or contaminants from microelectronic devices having same thereon. The composition comprises at least one complexing agent, at least one cleaning additive, at least one pH adjusting agent, water, and at least one oxylamine compound. Advantageously, the compositions show effective cleaning of cobalt-containing substrates and improved cobalt compatibility.

Abstract: The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.

Abstract: The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.

Abstract: A cleaning composition and process for cleaning an in-process microelectronic device substrate, e.g., by post-chemical mechanical polishing (CMP) cleaning, to remove residue from a surface thereof, wherein the cleaning composition may be especially effective for cleaning a substrate surface that includes exposed metal such as cobalt, copper, or both, along with dielectric or low k dielectric material, and wherein the cleaning composition includes corrosion inhibitor to inhibit corrosion of the exposed metal.

Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The amine-free composition preferably includes at least one oxidizing agent, at least one complexing agent, at least one basic compound, and water and has a pH in the range from about 2.5 to about 11.5. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: A feminine needs container may comprise an elongated member having a hollow compartment, a clothing attachment member coupled to the elongated member and configured to removably attach to a garment, wherein the hollow compartment is configured to receive and store at least one feminine needs product. The elongated member can be removably attachable to the garments via the clothing attachment member such that the feminine needs container may be concealed from public view and carried hands-free without the need for a larger bag/purse to carry them.

Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: A method, system and apparatus for media storage is described. In one embodiment, an apparatus for storing media units has a housing having a lid and a base. The base has a plurality of receptacles. Each of the plurality of receptacles has a plurality of walls. A first writing surface is coupled to the housing.

Abstract: A method and system for managing the creation and delivery of an electronic group message is disclosed. The electronic group message can be provided to two or more (i.e., a group) of signers to sign the electronic group message. Once signed, the electronic group message can be provided to one or more recipients. Alternatively, the electronic group message can be provided from a signer to a plurality of recipients, where different recipients receive different messages. One type of electronic group message is an electronic card known as a care card. Another type of electronic group message is an electronic card known as an honoree card. The ability to facilitate charitable giving and promote donative services can be supported through a website that uses electronic group messages and instant messages to highlight, track and encourage charitable giving of time and dollars.

Abstract: An embodiment of the disclosure provides a method for performing claim adjudication by an adherence server. The adherence server includes a non-transitory computer readable medium and a processor to execute computer executable instructions stored on the non-transitory computer readable medium, so that when the instructions are executed, the adherence server performs the method of: (a) receiving adherence data describing a patient's adherence to a prescribed medication; (b) determining an adherence level for the patient using the received adherence data; (c) comparing the adherence level to an adherence threshold; and (d) providing, to a second device, an adherence decision based on the comparison between the adherence data and the adherence threshold.

Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The compositions achieve highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material, copper interconnect material, or cobalt-containing materials.

Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include corrosion inhibitor(s) and surfactant(s). The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The amine-free composition preferably includes at least one oxidizing agent, at least one complexing agent, at least one basic compound, and water and has a pH in the range from about 2.5 to about 11.5. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: A method, apparatus, and system for placing and operating an automated donation station is disclosed. An automated donation station can be placed at a location upon receiving a request for an automated donation station from a charitable organization or event organizer. The automated donation station can be customized according to a particular requestor's needs. One or more donations may be collected using the donation station by displaying information to a donor, receiving a donation offer from the donor, and collecting donation details (e.g., payment information) from the donor. A donation receipt can be dispensed to the donor at the automated donation station. Further, donation gifts may be selected by the donor at the automated donation station and dispensed at the automated donation station.

Abstract: A method and system for managing the creation and delivery of an electronic group message is disclosed. The electronic group message can be provided to two or more (i.e., a group) of signers to sign the electronic group message. Once signed, the electronic group message can be provided to one or more recipients. Alternatively, the electronic group message can be provided from a signer to a plurality of recipients, where different recipients receive different messages. One type of electronic group message is an electronic card known as a care card.

Abstract: A method, apparatus, and system for placing and operating an automated donation station is disclosed. An automated donation station can be placed at a location upon receiving a request for an automated donation station from a charitable organization or event organizer. The automated donation station can be customized according to a particular requestor's needs. One or more donations may be collected using the donation station by displaying information to a donor, receiving a donation offer from the donor, and collecting donation details (e.g., payment information) from the donor. A donation receipt can be dispensed to the donor at the automated donation station. Further, donation gifts may be selected by the donor at the automated donation station and dispensed at the automated donation station.