Patents by Inventor Ellis Lin

Ellis Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating inductor and structure formed therefrom
    Patent number: 7167072
    Abstract: An inductor formed on a substrate having a dielectric layer thereon is disclosed. The inductor includes a first inductor pattern, a second inductor pattern a third inductor pattern. The first inductor pattern is formed within the dielectric layer, the second inductor pattern is formed on the first inductor pattern and electrically connected thereto, and the third inductor pattern is formed on the second inductor pattern and electrically connected thereto, wherein the first inductor pattern, the second inductor pattern, and the third inductor pattern have similar pattern. Because the thickness of the inductor can be increased by forming a multi-layer inductor structure, the resistance of the inductor, therefore, is reduced.
    Type: Grant
    Filed: March 25, 2004
    Date of Patent: January 23, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Chien-Chou Hung, Hua-Chou Tseng, Tsun-Lai Hsu, Cheng-Wen Fan, Chia-Hung Chin, Ellis Lin
  • Method of fabricating inductor and structure formed therefrom
    Publication number: 20050212641
    Abstract: An inductor formed on a substrate having a dielectric layer thereon is disclosed. The inductor includes a first inductor pattern, a second inductor pattern a third inductor pattern. The first inductor pattern is formed within the dielectric layer, the second inductor pattern is formed on the first inductor pattern and electrically connected thereto, and the third inductor pattern is formed on the second inductor pattern and electrically connected thereto, wherein the first inductor pattern, the second inductor pattern, and the third inductor pattern have similar pattern. Because the thickness of the inductor can be increased by forming a multi-layer inductor structure, the resistance of the inductor, therefore, is reduced.
    Type: Application
    Filed: March 25, 2004
    Publication date: September 29, 2005
    Inventors: Chien-Chou Hung, Hua-Chou Tseng, Tsun-Lai Hsu, Cheng-Wen Fan, Chia-Hung Chin, Ellis Lin