Abstract: An opaque cup has an inside measuring system having at least first and second scales viewable inside the cup. The first scale is preferably located in a bottom half of the volume of the cup and the second scale is located in a top half of the volume of the cup. Some cups may just have the first or second scale, some may have both, whether they be linearly aligned, or disposed angularly relative to one another, such as 180 degrees from one another.

Abstract: A jobsite-renewable floor finish comprising a film former and an appropriate amount of a lightness-inducing agent comprising a core-shell polymer system or sheathed polymer system provides a translucent hardened finish layer having an increased lightness value (as evaluated in relation to an appropriate color space) and a cleaner appearance than a finish made without such pigment.

Abstract: The present invention provides a method of polishing a semiconductor device comprising, polishing the semiconductor device with a polishing pad, the polishing pad comprising, a polymeric matrix and a dissolvable substance. The dissolvable substance is located at a work surface of the polishing pad and in a subsurface proximate the work surface. The method further comprises dissolving the dissolvable substance at the work surface while polishing the semiconductor device and wearing away the polishing pad while polishing the semiconductor device such that the subsurface becomes a new work surface that polishes the semiconductor device.

Abstract: A polishing pad used in a method for polishing a semiconductor device is made by combining a polymeric matrix and a dissolvable substance that dissolves upon contact with a polishing slurry.

Abstract: The present invention provides a method of polishing a semiconductor device comprising, polishing the semiconductor device with a polishing pad, the polishing pad comprising, a polymeric matrix and a dissolvable substance. The dissolvable substance is located at a work surface of the polishing pad and in a subsurface proximate the work surface. The method further comprises dissolving the dissolvable substance at the work surface while polishing the semiconductor device and wearing away the polishing pad while polishing the semiconductor device such that the subsurface becomes a new work surface that polishes the semiconductor device.

Abstract: The present invention provides a system for the reproduction of a work of fine art comprising a work of art, which may be a painting, etching, drawing, collage, or any other two dimensional form of fine art, being mounted vertically at a precision distance from a camera, and floodlamps for illuminating said work of art. The floodlamps are computer controlled by feedback from said camera so that intensity, focus, and spread will be even over the full surface of the work of art. The control of the illumination is provided by an illumination computer via optical fiber cables. The present invention also provides the process for reproduction of a work of fine art.

Abstract: A polishing pad used in a method for polishing a semiconductor device is made by combining a polymeric matrix and a dissolvable substance that dissolves upon contact with a polishing slurry.

Abstract: An article or polishing pad for altering a surface of a workpiece includes a polymeric matrix having a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, the work surface is made relatively softer than the subsurface as a result of exposure to the working environment. As the work surface wears during use, the subsurface immediately adjacent to the work surface becomes exposed to the working environment and becomes the relatively softer work surface. As a result, the relatively softer work surface is continuously regenerated. In an alternative embodiment, an article for altering a surface of a workpiece includes a work surface having a texture, and the texture includes artifacts arranged in a fractal pattern.

Abstract: The present invention relates to an article of manufacture or polishing pad for altering a surface of a workpiece, such as polishing or planarizing a semiconductor device. The article includes a polymeric matrix impregnated with a plurality of polymeric microelements, each polymeric microelement having a void space therein. The article has a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, polymeric microelements at the work surface of the article are less rigid than polymeric elements embedded in the subsurface. As the work surface of the article is abraded during use, the work surface of the pad may be continuously regenerated. In alternative preferred embodiments, the work surface may further include a minitexture and/or a macrotexture. Preferably, the minitexture is formed by fractal patterning at least a portion of the work surface.

Abstract: A method of improving the scrub resistance of a paint is provided. The method involves adding to a paint containing at least one polymeric binder having a glass transition temperature greater than about 20.degree. C. and an average particle size diameter of from about 70 nanometers to about 150 nanometers when said binder is formed from at least one acrylic monomer or from about 100 nanometers to about 50 nanometers when said binder is formed from at least 50% by weight of vinyl acetate, at least one coalescent at a concentration of at least about 10% by weight based on the weight of the polymeric binder and where said coalescent is a solvent for the polymeric binder. The method is particularly useful for improving the scrub resistance of flat latex paints.

Abstract: A timing signal generator operates in response to engine position sensors to generate pulse signals in sequence, the leading edge of each of said pulses essentially coinciding with the valve opening time of an associated one of the cylinders of an internal combustion engine. The outputs of the timing signal generator are fed to a control signal generator which generates a series of pulses, one for each of the engine cylinders, the leading edges of these pulses each approximately coinciding with the leading edge of a corresponding one of the timing signal generator outputs. The pulse widths of the outputs of the control signal generator, which are controlled in accordance with various engine parameters, are indicative of engine fuel requirements for optimum engine efficiency and/or minimum emission of pollutants.

Abstract: A timing mechanism actuated by hydraulic fluid uses a means responsive to vacuum to relatively displace a drive member and a driven member. When incorporated in an internal combustion engine for advancing or retarding an engine camshaft with respect to an engine crankshaft, the relative displacement is selectively controlled to reduce smog-producing exhaust emission and improve engine performance and fuel economy. In the preferred embodiment, the drive member and driven member form a fluid pressure chamber therebetween and the vacuum responsive means regulates the hydraluic fluid in said chamber. A vacuum control means which is responsive to engine operating conditions governs the application of vacuum to the vacuum responsive means. When engine operating conditions are at certain specified levels, a signal is transmitted to actuate the vacuum control means to allow the application of vacuum to the vacuum responsive means.

Abstract: An exhaust gas recirculation system for a vehicle internal combustion engine recirculates exhaust gases to the intake manifold of the engine to reduce smog-producing exhaust emission. Exhaust gases are recirculated into the intake manifold only during certain vehicle operating conditions. An injection means responsive to application of intake manifold vacuum governs injection of exhaust gases into the intake manifold. A vacuum control means allows application of intake manifold vacuum to the injection means only when activated. A control means responsive to vehicle operating parameters selectively activates the vacuum control means. With application of vacuum, the injection means allows recirculation of exhaust gases into the intake manifold.