Abstract: Apparatuses and methods are provided for a processing apparatus configured to authenticate an item based on at least one optical indicium associated with the item before processing the item. An interface may be configured to receive processing information from a machine readable element associated with an item to be processed. An image acquisition device may be configured to acquire image information relating to at least one optical indicium associated with an item. At least one processor may be configured to verify authentication of the item based upon the image information acquired by the image sensor unit. The processor may be further configured to receive processing information from the interface and to determine one or more instructions for processing the item based on the processing information. The apparatus may be further configured to processing the item in accordance with the instructions after the item has been verified as authentic.

Abstract: An apparatus for applying electromagnetic (EM) energy to a device (e.g., an exhaust treatment device) is disclosed. The apparatus may include at least one radiating element positioned to apply EM energy to the device at a plurality of Modulation Space Elements (MSEs), at least one processor configured to determine a first spatial distribution of EM energy to be achieved during application of EM energy to the device for selectively heating a target material associated with a first portion of the device in fluid communication with exhaust gas, and cause application of EM energy, such that the first spatial distribution of EM energy is applied to the target material.

Abstract: Apparatuses and methods are provided for a processing apparatus configured to authenticate an item based on at least one optical indicium associated with the item before processing the item. An interface may be configured to receive processing information from a machine readable element associated with an item to be processed. An image acquisition device may be configured to acquire image information relating to at least one optical indicium associated with an item. At least one processor may be configured to verify authentication of the item based upon the image information acquired by the image sensor unit. The processor may be further configured to receive processing information from the interface and to determine one or more instructions for processing the item based on the processing information. The apparatus may be further configured to processing the item in accordance with the instructions after the item has been verified as authentic.

Abstract: A method for imaging an article, the method includes: (i) providing short duration light pulses; (ii) directing the light pulses, by multiple optical heads, to illuminate multiple spaced apart areas of an article; and (iii) directing light from the multiple areas towards multiple two-dimensional light sensors; whereas (iv) imparting motion between the article and the multiple optical heads during the stages of providing and directing. An apparatus for inspecting an article that includes: (i) at least one pulsating source for providing short duration light pulses; (ii) multiple optical heads, adapted to direct the light pulses to illuminate multiple spaced apart areas of an article and to collect light from the multiple areas towards multiple two-dimensional light sensors; and (iii) a positioning device which is adapted to impart motion between the article and the multiple optical heads.

Abstract: A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Abstract: A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Abstract: Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors. According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors.

Abstract: A high-throughput inspection system and method.

Abstract: A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

Abstract: A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Abstract: A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Abstract: During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately constant frame coordinates, while mask defects have constant reticle coordinates, but inconstant scan frame coordinates. True defects are detected at different coordinates in consecutive frames with a known displacement therebetween.

Abstract: A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

Abstract: A high-throughput inspection system and method.

Abstract: A method for imaging an article, the method includes: (i) providing short duration light pulses; (ii) directing the light pulses, by multiple optical heads, to illuminate multiple spaced apart areas of an article; and (iii) directing light from the multiple areas towards multiple two-dimensional light sensors; whereas (iv) imparting motion between the article and the multiple optical heads during the stages of providing and directing. An apparatus for inspecting an article that includes: (i) at least one pulsating source for providing short duration light pulses; (ii) multiple optical heads, adapted to direct the light pulses to illuminate multiple spaced apart areas of an article and to collect light from the multiple areas towards multiple two-dimensional light sensors; and (iii) a positioning device which is adapted to impart motion between the article and the multiple optical heads.

Abstract: Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors. According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors.

Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

Abstract: Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors. According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors.

Abstract: A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

Abstract: A system for inspecting a specimen, such as a semiconductor wafer that uses a laser light source for providing a beam of light. The beam is applied to a traveling lens acousto-optic device having an active region and responsive to an RF input signal to selectively generate plural traveling lenses in the active region. The traveling lens acousto-optic device is operative to receive the light beam and generate plural flying spot beams, at the respective focus of each of the generated traveling lenses. A light detector unit, having a plurality of detector sections, each detector section having a plurality of light detectors and at least one multi-stage storage device operative to receive in parallel an input from the plurality of light detectors, is used to generate useable scan data. Information stored in each of the storage devices is serially read out concurrently from the multiple stages.