Patents by Inventor Emi USHIODA

Emi USHIODA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220133459
    Abstract: The present invention provides an application auxiliary tool that enables easy and quick application of a protective patch to a teat of a domestic animal, and a method of easily and quickly applying a protective patch to a teat of a domestic animal using the application auxiliary tool. An application auxiliary tool (2) for applying a protective patch (54) to a teat (64) of a domestic animal so as to protect a teat orifice (66) of the domestic animal includes: paired operation pieces (4a, 4b) that are rotatably connected to each other at their base ends (10a, 10b); and an elastic member (6) located between free ends (12a, 12b) of the paired operation pieces (4a, 4b).
    Type: Application
    Filed: June 13, 2019
    Publication date: May 5, 2022
    Applicant: TOKUYAMA CORPORATION
    Inventors: Emi USHIODA, Yoji INUI, Katsuhiro SHIRAI, Hitoshi KONDO, Kie YAMADA
  • Patent number: 9462698
    Abstract: The present invention provides: a method for manufacturing a metallized substrate by which a fine pattern can be formed more easily; a metallized substrate manufactured by the method; and a metal paste composition to be used in the method. The metallized substrate has: a sintered nitride ceramic substrate (10); a titanium nitride layer (20) on the sintered substrate (10); an adhesion layer (30) on the titanium nitride layer (20); and a copper plating layer (40) on or above the adhesion layer (30), wherein the adhesion layer (30) contains copper and titanium, and has a thickness of no less than 0.1 ?m and no more than 5 ?m.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: October 4, 2016
    Assignee: TOKUYAMA CORPORATION
    Inventors: Naoto Takahashi, Yasuyuki Yamamoto, Emi Ushioda
  • Patent number: 9017563
    Abstract: Provided is a plating method of a circuit substrate comprising a conductive pattern in which a metal layer containing at least silver and copper is exposed on an outer surface. The plating method comprises: step (A) of treating the circuit substrate with a first liquid agent containing an oxidizing agent; step (B) of treating the circuit substrate after the step (A) with a second liquid agent which dissolves copper oxide, and thereby removing copper oxide from the conductive pattern's surface; step (C) of treating the circuit substrate after the step (B) with a third liquid agent whose rate of dissolving silver oxide (I) at 25° C. is 1000 times or more faster than its rate of dissolving copper (0) at 25° C., and thereby removing silver oxide from the conductive pattern's surface; and step (D) of performing electroless plating on the conductive pattern of the circuit substrate after the step (C).
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: April 28, 2015
    Assignee: Tokuyama Corporation
    Inventors: Emi Ushioda, Tetsuo Imai
  • Publication number: 20130256014
    Abstract: The present invention provides: a method for manufacturing a metallized substrate by which a fine pattern can be formed more easily; a metallized substrate manufactured by the method; and a metal paste composition to be used in the method. The metallized substrate has: a sintered nitride ceramic substrate (10); a titanium nitride layer (20) on the sintered substrate (10); an adhesion layer (30) on the titanium nitride layer (20); and a copper plating layer (40) on or above the adhesion layer (30), wherein the adhesion layer (30) contains copper and titanium, and has a thickness of no less than 0.1 ?m and no more than 5 ?m.
    Type: Application
    Filed: December 2, 2011
    Publication date: October 3, 2013
    Applicant: TOKUYAMA CORPORATION
    Inventors: Naoto Takahashi, Yasuyuki Yamamoto, Emi Ushioda
  • Publication number: 20130048598
    Abstract: Provided is a plating method of a circuit substrate comprising a conductive pattern in which a metal layer containing at least silver and copper is exposed on an outer surface. The plating method comprises: step (A) of treating the circuit substrate with a first liquid agent containing an oxidizing agent; step (B) of treating the circuit substrate after the step (A) with a second liquid agent which dissolves copper oxide, and thereby removing copper oxide from the conductive pattern's surface; step (C) of treating the circuit substrate after the step (B) with a third liquid agent whose rate of dissolving silver oxide (I) at 25° C. is 1000 times or more faster than its rate of dissolving copper (0) at 25° C., and thereby removing silver oxide from the conductive pattern's surface; and step (D) of performing electroless plating on the conductive pattern of the circuit substrate after the step (C).
    Type: Application
    Filed: June 20, 2012
    Publication date: February 28, 2013
    Inventors: Emi USHIODA, Tetsuo IMAI