Abstract: A polysilane composition characterized as containing a polysilane compound and a silicone compound in the ratio (polysilane compound:silicon compound) by weight of 80:20-5:95, and also containing an organic peroxide in the amount of 1-30 parts by weight, based on 100 parts by weight of the polysilane compound and silicone compound, wherein the silicone compound contains 40-100% by weight of a double bond containing silicon compound.

Abstract: A silicone compound, either alone or in combination with a photoacid generator, is added to a branched polysilane compound. According to this constitution, highly reliable polymer material and polymer film can be realized which have excellent stability of refractive index against heat and high transparency and, when the photoacid generator is contained, can cause a change in refractive index upon exposure to ultraviolet light with high sensitivity and high resolution.

Abstract: A silicon-containing compound of solid state including neither a compound capable of dissociating into positive and negative ions nor a liquid electrolyte and a gel electrolyte, and exhibiting a dielectric relaxation phenomenon in the frequency range of 100 Hz to 1 MHz, and preferably a sintered body of silicon-containing compound obtained by sintering at least one of the silicon-containing compounds selected from polysilanes and silicones which are dissolvable to organic solvents.

Abstract: The metal colloid pattern formation method is a method for forming metal colloid patterns on a substrate by forming a photosensitive layer on a substrate by applying a photosensitive resin composition containing an organic solvent and a polysilane soluble in the organic solvent to the substrate, forming a latent image of the patterns by selectively exposing the photosensitive layer, bringing a metal colloid-containing solution into contact with the photosensitive layer, and forming patterns of the metal colloid by adsorbing the metal colloid in the exposed parts.

Abstract: A silicone compound, either alone or in combination with a photoacid generator, is added to a branched polysilane compound. According to this constitution, highly reliable polymer material and polymer film can be realized which have excellent stability of refractive index against heat and high transparency and, when the photoacid generator is contained, can cause a change in refractive index upon exposure to ultraviolet light with high sensitivity and high resolution.

Abstract: The present invention provides the near infrared polymerizable composition which has high sensitivity sufficient to provide excellent curability to the coating composition containing the same, even if the coating composition contains the pigment as well. The present invention provides a near infrared polymerizable composition comprising a cyanine dye, a S-triazine compound, an organoboron salt and an ethylenically unsaturated compound.