Patents by Inventor Emiel Jozef Eussen

Emiel Jozef Eussen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus having an encoder type position sensor system
    Patent number: 8836913
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having encoder type position sensor system
    Patent number: 8760615
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 24, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic Apparatus Having an Encoder Type Position Sensor System
    Publication number: 20120075613
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Paul STEIJAERT, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having encoder type position sensor system
    Publication number: 20090002653
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: May 23, 2008
    Publication date: January 1, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Van Der Pasch, Ruud Antonius Beerens, Albertus Adrianus Smits
  • LITHOGRAPHIC APPARATUS, AND APPARATUS AND METHOD FOR MEASURING AN OBJECT POSITION IN A MEDIUM
    Publication number: 20070146661
    Abstract: A lithographic apparatus has a position measuring apparatus configured to measure a position of a substrate support or a patterning support in a medium. The position measuring apparatus has a barometer to measure a pressure of the medium, thereby providing a pressure signal. The position measuring apparatus has a distance measuring device measuring a reference distance, thereby providing a reference distance signal. The position measuring apparatus has a processor that converts the reference distance signal into a pressure-change signal; processes the pressure-change signal in a similar way as the pressure signal, thereby providing a processed pressure-change signal; determines a difference between the processed pressure-change signal and the pressure signal, thereby providing a drift signal; determines a difference between the pressure-change signal and the drift signal, thereby providing an absolute pressure signal; and corrects a position measurement on the basis of the absolute pressure signal.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 28, 2007
    Applicant: ASML Netherlands B.V.
    Inventor: Emiel Jozef Eussen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132980
    Abstract: A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 14, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Carolus Johannes Schoormans, Emiel Jozef Eussen, Willem Herman Koenen, Nicolas Lallemant, Engelbertus Antonius Van Der Pasch, Johannes Mathias Adriaens