Patents by Inventor Emiel Melanie Eussen

Emiel Melanie Eussen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060139586
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system projects the patterned radiation beam onto a target portion of the substrate. An interferometer system measures a position of the substrate table, and generates a disturbance frequency by optical feedback. A position control system controls the position of the support structure and the substrate table on the basis of the position measurement of the interferometer system. The position control system selects a substrate table speed to prevent a positioning error due to the disturbance frequency.
    Type: Application
    Filed: December 23, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Emiel Melanie Eussen