Abstract: An apparatus and method for predicting a fertility window include an image capture device and a processor. The fertility window includes a period of increased fecundability for a woman based on optical monitoring of facial features. The image capture device is configured to record images including facial features of a subject. The processor is configured to receive data corresponding to the recorded plural images; determine from the data changes in the facial features; and predict a fertility window based on the determination.

Abstract: A medical interventional tool has distal and proximal ends. A responsive material is located at the distal end or elsewhere along the interventional tool and is capable of providing a temperature-dependent or pressure-dependent optical response. At least one optical guide is in optical communication with the responsive material to collect an optical signal from the responsive material located at the distal end or other location along the interventional tool. The at least one optical guide further guides the collected optical signal to an optical output at the proximal end of the interventional tool. An optical response analyzer is configured to receive the collected optical signal from the optical output and to process the collected optical signal to derive therefrom a temperature or pressure reading or indication representative of a temperature or pressure at the distal end or other location along the interventional tool.

Abstract: The invention relates to a processing device (110) and a method for manufacturing such a device. In a preferred embodiment, a mixture of magnetic particles (MP), a matrix material, and a volatile carrier is deposited onto binding sites (112) of a reaction surface (113). The deposited mixture is then dried while the magnetic particles (MP) are pulled away from the reaction surface (113) by a magnetic field (B). Thus unspecific binding of magnetic particles to the binding sites can be prevented.

Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.

Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.

Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.

Abstract: In an embodiment, an apparatus (12) is presented that predicts a fertility window comprising a period of increased fecundability for a woman based on optical monitoring of facial features.

Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.

Abstract: The invention relates to a processing device (110) and a method for manufacturing such a device. In a preferred embodiment, a mixture of magnetic particles (MP), a matrix material, and a volatile carrier is deposited onto binding sites (112) of a reaction surface (113). The deposited mixture is then dried while the magnetic particles (MP) are pulled away from the reaction surface (113) by a magnetic field (B). Thus unspecific binding of magnetic particles to the binding sites can be prevented.

Abstract: The invention relates to a nuclear magnetic resonance imaging radio frequency-receiver (112; 216; 308; 404), the receiver (112; 216; 308; 404) being adapted to receive analog signals from at least one radio frequency receiver coil unit (106; 200; 202; 300; 400; 402), the radio frequency receiver (112; 216; 308; 404) comprising: an analog-digital converter (118; 226) to convert the analog pre-amplified magnetic resonance signal into a digital signal, means (120; 230) for digital down converting the digital signal and a first communication interface (130; 252) adapted for transmitting the down converted digital signal via a communication link (e.g. wireless, optical or wire-bound).

Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.

Abstract: Causing a self-assemblable block copolymer (BCP) having first and second blocks to migrate from a region surrounding a lithography recess of the substrate and a dummy recess on the substrate to within the lithography recess and the dummy recess, causing the BCP to self-assemble into an ordered layer within the lithography recess, the layer having a first block domain and a second block domain, and selectively removing the first domain to form a lithography feature having the second domain within the lithography recess, wherein a width of the dummy recess is smaller than the minimum width required by the BCP to self-assemble, the dummy recess is within the region of the substrate surrounding the lithography recess from which the BCP is caused to migrate, and the width between portions of a side-wall of the lithography recess is greater than the width between portions of a side-wall of the dummy recess.

Abstract: The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing.

Abstract: A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features.

Abstract: Apparatus for producing thin layers of a fluid sample for analysis, has a two dimensional array of analysis chambers (45), and a branching pattern of entry channels (25) coupled to the array to enable the analysis chambers to be filled in parallel. The analysis chambers are planar with a height less than that of the entry channels so as to produce the thin layers when filled with the fluid sample. The array enables more spacers between chambers in a given area, so that variations in height of the chambers can be reduced, while still enabling fast filling of the chambers. The analysis chambers can be suitable for capillary filling by a specified fluid sample such as blood. A pattern of exit channels (35) can be coupled to the array. The entry and exit channels can form comb patterns, fingers of the comb patterns being interdigitated, and the analysis chambers being arranged between the interdigitated fingers of the comb patterns.

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract: The present invention is related to a method for the production of cell sheets comprising at least two different cell types, said method comprising the steps of providing a continuous cell sheet which is disposed on a substrate comprising shape transition properties and/or alterable surface characteristics; exposing said continuous cell sheet to a releasing agent in a patterned fashion; washing the cell sheet after exposure to the releasing agent in order to remove cells which have been affected by the releasing agent, and repopulating the gaps remaining after the cells which have been affected by the releasing agent have been removed with a second cell type.

Abstract: A method is disclosed to form a row of mutually spaced elongate lithography features along an axis on a substrate, for instance for use as contact electrodes for a NAND device. The method involves directing alignment of self-assemblable block copolymer (BCP) composition in a trench in a resist layer on the substrate, having the substrate as base, with an epitaxy feature in the trench to cause the ordered BCP layer to have elongate domains stretching across the trench width, substantially parallel to each other and to the substrate. The ordered BCP layer is then used as a resist to pattern the substrate. A BCP composition adapted to assemble with spaced discontinuous elongate elliptical domains is disclosed. The method may allow for sub-resolution contact arrays to be formed using UV lithography.

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract: A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.