Patents by Inventor Emiko Daimon

Emiko Daimon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230272833
    Abstract: Provided is a friction modifier giving excellent formability in producing a friction material and capable of reducing rust formation on a rotor even when the moisture-absorbed friction material is left pressed against the rotor for a long. The friction modifier is made of a titanate compound having a layered crystal structure, wherein the titanate compound has a rate of chlorine ion dissolution of 0.5 ppm to 400 ppm.
    Type: Application
    Filed: July 7, 2021
    Publication date: August 31, 2023
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventor: Emiko Daimon
  • Publication number: 20230204083
    Abstract: Provided is a friction modifier giving excellent formability in producing a friction material and capable of reducing rust formation on a rotor even when the moisture-absorbed friction material is left pressed against the rotor for a long. The friction modifier is made of a titanate compound having a tunnel crystal structure, wherein the titanate compound has a rate of chlorine ion dissolution of 0.5 ppm to 400 ppm.
    Type: Application
    Filed: July 7, 2021
    Publication date: June 29, 2023
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventor: Emiko Daimon
  • Patent number: 10843933
    Abstract: Provided is a friction material composition that can increase the coefficient of friction and the wear resistance, reduce the compressive deformation rate, and improve the yield upon hot forming, even when being free of copper component or having a small content of copper component. The friction material composition contains: titanate compound powder made of non-fibrous titanate compound particles; barium sulfate powder; and a thermosetting resin, wherein the titanate compound powder has an alkali metal ion dissolution rate of 15.0% by mass or less, the barium sulfate powder has a volume-based 50% cumulative particle diameter (D50) of 0.1 ?m to 20.0 ?m, and a content of copper component is 0.5% by mass or less in terms of copper element in a total amount of 100% by mass of the friction material composition.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: November 24, 2020
    Assignee: OTSUKA CHEMICAL CO., LTD.
    Inventors: Shogo Kamada, Kazuhiro Tada, Emiko Daimon, Toshiaki Yagi
  • Publication number: 20200002184
    Abstract: Provided is a friction material composition that can increase the coefficient of friction and the wear resistance, reduce the compressive deformation rate, and improve the yield upon hot forming, even when being free of copper component or having a small content of copper component. The friction material composition contains: titanate compound powder made of non-fibrous titanate compound particles; barium sulfate powder; and a thermosetting resin, wherein the titanate compound powder has an alkali metal ion dissolution rate of 15.0% by mass or less, the barium sulfate powder has a volume-based 50% cumulative particle diameter (D50) of 0.1 ?m to 20.0 ?m, and a content of copper component is 0.5% by mass or less in terms of copper element in a total amount of 100% by mass of the friction material composition.
    Type: Application
    Filed: March 5, 2018
    Publication date: January 2, 2020
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Shogo Kamada, Kazuhiro Tada, Emiko Daimon, Toshiaki Yagi
  • Patent number: 9505891
    Abstract: Provided are: a resin composition that can be given excellent formability and wear resistance when used as a friction material or the like; and a method for producing the resin compound. A titanate compound, which is a salt of at least one element selected from the group consisting of alkali metals and alkaline earth metals, is dispersively contained in a thermosetting resin prior to curing.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: November 29, 2016
    Assignee: OTSUKA CHEMICAL CO., LTD.
    Inventors: Emiko Daimon, Takuya Nomoto
  • Publication number: 20160108982
    Abstract: Provided is a friction material and a friction material for a drum brake which have an excellent fade characteristic and excellent wear resistance. A friction material contains a titanate compound and a binder, wherein the titanate compound is contained in 1 to 22% of the total volume of the friction material and the binder is contained in 18% or more of the total volume of the friction material.
    Type: Application
    Filed: May 7, 2014
    Publication date: April 21, 2016
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Takuya Nomoto, Emiko Daimon
  • Publication number: 20160046772
    Abstract: Provided are: a resin composition that can be given excellent formability and wear resistance when used as a friction material or the like; and a method for producing the resin compound. A titanate compound, which is a salt of at least one element selected from the group consisting of alkali metals and alkaline earth metals, is dispersively contained in a thermosetting resin prior to curing.
    Type: Application
    Filed: March 12, 2014
    Publication date: February 18, 2016
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Emiko Daimon, Takuya Nomoto
  • Patent number: 7847043
    Abstract: An organobismuth compound represented by the formula (1) wherein R1 and R2 are C1-C8 alkyl, aryl, substituted aryl or an aromatic heterocyclic group, R3 and R4 are each a hydrogen atom or C1-C8 alkyl, and R5 is aryl, substituted aryl, an aromatic heterocyclic group, acyl, amido, oxycarbonyl or cyano.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: December 7, 2010
    Assignees: Otsuka Chemical Co., Ltd., Japan Science and Technology Agency
    Inventors: Shigeru Yamago, Takashi Kameshima, Kazuhiro Kawano, Osamu Ito, Emiko Daimon, Ken Shu, Kunihiko Sugoh
  • Publication number: 20070265404
    Abstract: An organobismuth compound represented by the formula (1) wherein R1 and R2 are C1-C8 alkyl, aryl, substituted aryl or an aromatic heterocyclic group, R3 and R4 are each a hydrogen atom or C1-C8 alkyl, and R5 is aryl, substituted aryl, an aromatic heterocyclic group, acyl, amido, oxycarbonyl or cyano.
    Type: Application
    Filed: December 9, 2005
    Publication date: November 15, 2007
    Inventors: Shigeru Yamago, Takashi Kameshima, Kazuhiro Kawano, Osamu Ito, Emiko Daimon, Ken Shu, Kunihiko Sugoh
  • Patent number: 6414100
    Abstract: A novel compound suitable for use as an ultraviolet absorber is provided. Further provided are a resin composition and a coating material each containing the novel compound. A bis(benzotriazolyl phenol) compound represented by the following general formula (1), a resin composition containing the compound, and an ultraviolet-absorbing polymer prepared by copolymerization of the compound: [wherein A represents a methylene group, a (CH3)2C group or a C2H5(CH3)C group; R1 and R6, either identical to or different from each other, represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, an aryl group, an alkoxy group having 1-4 carbon atoms or a halogen atom; R2 and R4, either identical to or different from each other, represent a straight-chain or branched alkylene group having 1-6 carbon atoms; R3 and R5each represents a hydrogen atom or a methyl group; and 1, m and n each indicates 0 or 1].
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: July 2, 2002
    Inventors: Emiko Daimon, Koji Mori, Mitsuo Akada
  • Patent number: 6281313
    Abstract: The present invention provides a 2,2′-bis(6-benzotriazolylphenol) compound represented by the formula wherein A represents a methylene group or the like, R1 and R5 each represent a hydrogen atom, an alkyl group or the like, R2 represents a hydrogen atom or the like, R3 represents an alkylene group or the like, and R4 represents a hydrogen atom or a methyl group. The compound of the invention is useful as an UV absorber. Further, the compound of the invention can be incorporated into a copolymer by copolymerization with a vinyl monomer, and a polymer composition containing the copolymer can be used as an UV absorber.
    Type: Grant
    Filed: May 11, 2000
    Date of Patent: August 28, 2001
    Assignee: Otsuka Chemical Co., Ltd.
    Inventors: Shinji Nakano, Emiko Daimon, Minoru Yamamoto, Mitsuo Akada
  • Patent number: 6084104
    Abstract: The present invention provides a 2,2'-bis(6-benzotriazolylphenol) compound represented by the formula ##STR1## wherein A represents a methylene group or the like,R.sup.1 and R.sup.5 each represent a hydrogen atom, an alkyl group or the like,R.sup.2 represents a hydrogen atom or the like,R.sup.3 represents an alkylene group or the like, andR.sup.4 represents a hydrogen atom or a methyl group.The compound of the invention is useful as an UV absorber. Further, the compound of the invention can be incorporated into a copolymer by copolymerization with a vinyl monomer, and a polymer composition containing the copolymer can be used as an UV absorber.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: July 4, 2000
    Assignee: Otsuka Chemical Co., Ltd.
    Inventors: Shinji Nakano, Emiko Daimon, Minoru Yamamoto, Mitsuo Akada
  • Patent number: 5922882
    Abstract: An object of the present invention is to provide a novel bisbenzotriazolylphenol compound having a UV absorving effect. The bisbenzotriazolylphenol compound of the invention is represented by the formula ##STR1## wherein A is a direct bond or represents a C.sub.1-6 alkylene group, a --C(CH.sub.3).sub.2 -- group, a --C(C.sub.2 H.sub.5)(CH.sub.3)-- group, a --O-- group or a --NH-- group, R.sup.1 and R.sup.3 are the same or different and each represent a hydrogen atom, a C.sub.1-4 alkyl group, an aryl group, a C.sub.1-4 alkoxy group or a halogen atom, and R.sup.2 and R.sup.4 are the same or different and each represent a hydroxyl group or a C.sub.1-12 straight- or branched-chain hydroxyalkyl group.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: July 13, 1999
    Assignee: Otsuka Kagaku Kabushiki Kaisha
    Inventors: Koji Mori, Emiko Daimon, Koji Ishida, Shinji Nakano, Takashi Ogawa, Kazuhiro Kawano, Mitsuo Akada