Patents by Inventor Emiko Nishida

Emiko Nishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for forming an optical multilayer filter
    Publication number: 20040076740
    Abstract: In a film forming method for forming an optical multilayer filter by detecting the thickness of each layer by means of an optical thickness monitor (OTM) 15 and by controlling a film forming apparatus 11 based on the OTM detected output: the light source of the OTM 15 is formed by a variable wavelength light source whose wavelength is variable over the range of &lgr;1 nm to &lgr;2nm, including &lgr; nm; the optical thickness of each of &lgr;/4-oriented layers is optimized within the range of &lgr;1/4 nm to &lgr;2/4 nm; the wavelength of the variable wavelength light source 12 for each layer is selected so that its transmittance reaches an extreme value at the optical thickness of each layer; and the formation of each layer is stopped upon detection of the extreme value of the transmittance.
    Type: Application
    Filed: October 14, 2003
    Publication date: April 22, 2004
    Applicant: Japan Aviation Electronics Industry Limited
    Inventors: Emiko Nishida, Noboru Uehara
  • Method and apparatus for forming an optical multilayer filter
    Publication number: 20020001668
    Abstract: In a film forming method for forming an optical multilayer filter by detecting the thickness of each layer by means of an optical thickness monitor (OTM) 15 and by controlling a film forming apparatus 11 based on the OTM detected output: the light source of the OTM 15 is formed by a variable wavelength light source whose wavelength is variable over the range of &lgr;1 nm to &lgr;2 nm, including &lgr;nm; the optical thickness of each of &lgr;/4-oriented layers is optimized within the range of &lgr;1/4 nm to &lgr;2/4 nm; the wavelength of the variable wavelength light source 12 for each layer is selected so that its transmittance reaches an extreme value at the optical thickness of each layer; and the formation of each layer is stopped upon detection of the extreme value of the transmittance.
    Type: Application
    Filed: June 25, 2001
    Publication date: January 3, 2002
    Inventors: Emiko Nishida, Noboru Uehara
  • Preparation process of 4,4'-biphenol, precursor of same and preparation process of precursor
    Patent number: 4939306
    Abstract: A novel compound, 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol, and a novel preparation process of 4,4'-biphenol by using the novel compound as the raw material.4-(4-Hydroxyphenyl)-3-cyclohexene-1-ol can be obtained by conducting a thermal decomposition reaction of 4,4-bis(4-hydroxyphenyl)cyclohexanol. 4,4'-Biphenol can be industrially manufactured by conducting a dehydrogenation reaction of 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol.
    Type: Grant
    Filed: April 14, 1989
    Date of Patent: July 3, 1990
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Tohru Miura, Teruyuki Nagata, Koju Okazaki, Masayuki Furuya, Emiko Nishida
  • Preparation process of 4,4'-biphenol, precursor of same and preparation process of precursor
    Patent number: 4877907
    Abstract: A novel compound, 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol, and a novel preparation process of 4,4'-biphenol by using the novel compound as the raw material.4-(4-Hydroxyphenyl)-3-cyclohexene-1-ol can be obtained by conducting a thermal decomposition reaction of 4,4-bis(4-hydroxyphenyl)cyclohexanol. 4,4'-Biphenol can be industrially manufactured by conducting a dehydrogenation reaction of 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol.
    Type: Grant
    Filed: April 14, 1989
    Date of Patent: October 31, 1989
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Tohru Miura, Teruyuki Nagata, Koju Okazaki, Masayuki Furuya, Emiko Nishida
  • Preparation process of 4,4'-biphenol, precursor of same and preparation process of precursor
    Patent number: 4873374
    Abstract: A novel compound, 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol, and a novel preparation process of 4,4'-biphenol by using the novel compound as the raw material.4-(4-Hydroxyphenyl)-3-cyclohexene-1-ol can be obtained by conducting a thermal decomposition reaction of 4,4-bis(4-hydroxyphenyl)cyclohexanol. 4,4'-Biphenol can be industrially manufactured by conducting a dehydrogenation reaction of 4-(4-hydroxyphenyl)-3-cyclohexene-1-ol.
    Type: Grant
    Filed: April 6, 1988
    Date of Patent: October 10, 1989
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Tohru Miura, Teruyuki Nagata, Koju Okazaki, Masayuki Furuya, Emiko Nishida