Patents by Inventor Emiko Shirasaki

Emiko Shirasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9788701
    Abstract: According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b).
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: October 17, 2017
    Assignee: KAO CORPORATION
    Inventors: Taeko Hayase, Emiko Shirasaki, Minoru Wada
  • Patent number: 9782051
    Abstract: Provided is a nonwoven fabric substrate (1) in which ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on each of both surfaces (1a, 1b), and apertures (4) penetrating the grooves (3) of both surfaces are formed. The ridges (2) and the grooves (3) extend parallel to each other. The ridges (2) and the grooves (3) extend in a direction intersecting with each of a pair of both sides (1c, 1d) extending in parallel of the nonwoven fabric substrate (1). In planar view, each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h), and arrangement patterns of the aperture portion (3h) and the non-aperture portion (3n) provided in the adjacent grooves (3) are different from each other.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: October 10, 2017
    Assignee: KAO CORPORATION
    Inventors: Taeko Hayase, Emiko Shirasaki, Minoru Wada
  • Publication number: 20150297053
    Abstract: According to a nonwoven fabric substrate (1) for wiping sheet of the invention, ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on both surfaces (1a, 1b), and apertures (4) are formed in the grooves (3). Each of the ridges (2) and the grooves (3) extend parallel to one side of the nonwoven fabric substrate (1). Each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion (3n) which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h). An arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in the groove (3a) is different from an arrangement pattern of the aperture portion (3h) and the non-aperture portion (3n) provided in an adjacent groove (3b).
    Type: Application
    Filed: November 8, 2013
    Publication date: October 22, 2015
    Applicant: KAO CORPORATION
    Inventors: Taeko Hayase, Emiko Shirasaki, Minoru WADA
  • Publication number: 20150282686
    Abstract: Provided is a nonwoven fabric substrate (1) in which ridges (2) and grooves (3) are alternately formed at positions corresponding to each other on each of both surfaces (1a, 1b), and apertures (4) penetrating the grooves (3) of both surfaces are formed. The ridges (2) and the grooves (3) extend parallel to each other. The ridges (2) and the grooves (3) extend in a direction intersecting with each of a pair of both sides (1c, 1d) extending in parallel of the nonwoven fabric substrate (1). In planar view, each of the grooves (3) alternately includes an aperture portion (3h) which has a plurality of the apertures (4), and a non-aperture portion which has no aperture (4) and is longer than a distance between the nearest end portions of the adjacent apertures (4) in the aperture portion (3h), and arrangement patterns of the aperture portion (3h) and the non-aperture portion (3n) provided in the adjacent grooves (3) are different from each other.
    Type: Application
    Filed: November 8, 2013
    Publication date: October 8, 2015
    Applicant: KAO CORPORATION
    Inventors: Taeko Hayase, Emiko Shirasaki, Minoru Wada