Abstract: Described herein are devices and methods utilizing cascade photocatalysis to drive multiple chemical reactions via a series of photoelectrochemical catalysts driven by the conversion of light into current by one or more photovoltaic devices. The described devices and methods are tunable and may be used in conjunction with different reactants and products, including the conversion of carbon dioxide into valuable hydrocarbon products.

Abstract: Described herein are systems and methods of utilizing nanochannels generated in the sacrificial layer of a semiconductor substrate to increase epitaxial lift-off speeds and facilitate reusability of GaAs substrates. The provided systems and methods may utilize unique nanochannel geometries to increase the surface area exposed to the etchant and further decrease etch times.

Abstract: A method for depositing III-V alloys on substrates and compositions therefrom. A first layer comprises a Group III element. A second layer comprises a silica. A substrate has a surface. The second layer is deposited onto a first layer. The depositing is performed by a sol-gel method. The second layer is exposed to a precursor that comprises a Group V element. At least one of the precursor or the Group V element diffuse through the silica. The first layer is transformed into a solid layer comprising a III-V alloy, wherein at least a portion of the first layer to a liquid. The silica retains the liquified first layer, enabling at least one of the precursor or the Group V element to diffuse into the liquid, resulting in the forming of the III-V alloy.

Abstract: Presented herein are embodiments of a tandem solar panel subunit with 2-terminals, made from two 3-terminal cell tandems, whose top-cells are strongly current-mismatched to the Si 3-terminal bottom cell.

Abstract: Described herein are systems and methods of utilizing nanochannels generated in the sacrificial layer of a semiconductor substrate to increase epitaxial lift-off speeds and facilitate reusability of GaAs substrates. The provided systems and methods may utilize unique nanochannel geometries to increase the surface area exposed to the etchant and further decrease etch times.

Abstract: A method for depositing III-V alloys on substrates and compositions therefrom. A first layer comprises a Group III element. A second layer comprises a silica. A substrate has a surface. The second layer is deposited onto a first layer. The depositing is performed by a sol-gel method. The second layer is exposed to a precursor that comprises a Group V element. At least one of the precursor or the Group V element diffuse through the silica. The first layer is transformed into a solid layer comprising a III-V alloy, wherein at least a portion of the first layer to a liquid. The silica retains the liquified first layer, enabling at least one of the precursor or the Group V element to diffuse into the liquid, resulting in the forming of the III-V alloy.

Abstract: Described herein are devices and methods utilizing cascade photocatalysis to drive multiple chemical reactions via a series of photoelectrochemical catalysts driven by the conversion of light into current by one or more photovoltaic devices. The described devices and methods are tunable and may be used in conjunction with different reactants and products, including the conversion of carbon dioxide into valuable hydrocarbon products.

Abstract: The present disclosure relates to a method that includes directing a first precursor that includes a Group III element and a second precursor that includes a Group V element to a chamber containing crystalline silicon, where the crystalline silicon includes a substantially planar surface that is patterned with a plurality of v-grooves and the directing results in the forming of a III-V crystal preferentially on a (111) Si surface of the crystalline silicon.

Abstract: Presented herein are embodiments of a tandem solar panel subunit with 2-terminals, made from two 3-terminal cell tandems, whose top-cells are strongly current-mismatched to the Si 3-terminal bottom cell.

Abstract: The present disclosure relates to a method that includes directing a first precursor that includes a Group III element and a second precursor that includes a Group V element to a chamber containing crystalline silicon, where the crystalline silicon includes a substantially planar surface that is patterned with a plurality of v-grooves and the directing results in the forming of a III-V crystal preferentially on a (111) Si surface of the crystalline silicon.

Abstract: Disclosed herein are materials and methods useful for growth of III-V materials on Si that result in the reduction of costs for manufacturing III-V PV.