Abstract: An achromatic magnetic mass spectrometer, for example of the SIMS type with double focusing, comprises means for canceling the four aberrations of the second order, and means for canceling the off-axis achromatism and for modulating the dispersion in mass.

Abstract: An achromatic magnetic mass spectrometer, for example of the SIMS type with double focusing, comprises means for canceling the four aberrations of the second order, and means for canceling the off-axis achromatism and for modulating the dispersion in mass.

Abstract: The present invention relates to a device for measuring the X-ray emission produced by an object, or specimen, exposed to an electron beam. The device includes at least one subassembly or electron column, which is used to produce and control the electron beam, and a support for positioning the object measured. It also includes spectral analysis means for analyzing the X-rays emitted by the specimen to be analyzed and optical means for controlling the position of the specimen relative to the beam. The energy of the beam created and the intensity of the electron current obtained are used to meet the sensitivity, resolution and precision requirements demanded by semiconductor manufacturers. The invention applies especially to checking the fabrication of an integrated-circuit wafer.

Abstract: The present invention relates to a device for measuring the X-ray emission produced by an object, or specimen, exposed to an electron beam. The device includes at least one subassembly or electron column, which is used to produce and control the electron beam, and a support for positioning the object measured. It also includes spectral analysis means for analyzing the X-rays emitted by the specimen to be analyzed and optical means for controlling the position of the specimen relative to the beam. The energy of the beam created and the intensity of the electron current obtained are used to meet the sensitivity, resolution and precision requirements demanded by semiconductor manufacturers. The invention applies especially to checking the fabrication of an integrated-circuit wafer.

Abstract: The disclosed mass spectrometer has, positioned between an input slit and an output slit, crossed by particles emitted by a sample, an optical coupling system placed between two respectively electrostatic and magnetic sectors. The optical coupling system comprises at least two lenses with slits oriented respectively along a first direction in which the path of the ions is incurvated by the electrostatic and magnetic sectors and along a direction perpendicular to the plane of the path. The position of the two lenses on the optical axis of the spectrometer is determined to obtain a compensation for the chromatic dispersions throughout the axis downline from the spectrometer, a stigmatic image of the input slit in the output plane of the spectrometer and a stigmatic image downline from the spectrometer.

Abstract: An electronic optics device with variable illumination and aperture limitation is provided including, between a particle source and an object an image of which it is desired to project in an image plane, a set of three lenses with electronically controllable focal lengths, the first one being situated as close as possible to the source and associated, in its main plane or in the vicinity of this plane, with an aperture limitation diaphragm, the object being placed in the main plane of the third lens or in the vicinity thereof, the focal length of these three lenses being controlled so as to give to the section of the electronic beam in the object plane a value determining the desired illumination and to the image of the diaphragm a diameter and a position determining the desired aperture of the beam.

Abstract: The network comprises several memory elements made of ferroelectric polymer, arranged in a matrix organization at the intersections of row and column electrodes. Each memory element (Mij) memorizes a synaptic coefficient a.sub.ij of the network which may be restored by pyroelectric effect on the corresponding column of the network. Amplifier circuits, respectively connected to the columns, give a voltage which is equal to the sum, to which a sign is assigned, of the products of the synaptic coefficients by the voltage components applied to each of the lines of the network.

Abstract: An electronic beam device is provided for projecting the image of an object on a sample, including two electromagnetic lens reduction stages. A single insulating tube is disposed between an object and the same plane, this tube having an inner metallized face.

Abstract: The device according to the invention comprises a source and an electronic optical system permitting the projection of the beam onto a target plane. According to the invention, a diaphragm for the angular limitation of the beam is positioned between the source and the electronic optical system, the useful current of the beam at the target plane being more than one thousandth of the current emitted by the source.

Abstract: An electronic optical objective applicable to electrolithographic devices for microlithography in particular in semiconductor and integrated circuits fabrication. The objective comprises an electromagnetic lens formed by two polepieces, one of which is of soft iron and the other of ferrite, spaced from each other by an airgap. It further comprises two deflectors, one of which is placed in a longitudinal zone of weak magnetic field and the other is placed in a longitudinal zone of strong magnetic field. These two deflectors are identical and offset from each other by a certain angle, for example from 215.degree. to 225.degree..