Abstract: An optical apparatus for Raman scattering microscopy includes a laser source that emits a laser beam at an excitation wavelength ?, a microscope objective that receives the laser beam and focuses the laser beam in an image plane of the microscope objective, the focused laser beam being intended to illuminate a sample, an optical system for collecting a Raman scattering optical beam, and detection elements suitable for detecting the Raman scattering beam collected. More particularly, the Raman scattering microscopy apparatus further includes an adaptive optics system positioned on an optical path of the Raman scattering beam, the said adaptive optics system is configured to form the image of an energy distribution inside the confocal hole on the entrance slit of the spectrometer in such a way as to obtain an energy distribution in a direction of a height of the slit.

Abstract: An optical beam scanning microscopy apparatus includes a light source adapted to emit an optical beam (2) and a microscope objective (1) adapted for focusing the optical beam (2) in an object plane (11). The microscopy apparatus includes first and second reflecting optical elements (M-X1, M-X2) disposed in series on the optical path of the optical beam (2) between the light source and the microscope objective (1), first elements of angular tilting (21, 25) adapted for tilting the first reflecting optical elements (M-X1, M-XY1) according to a first predetermined rotation angle (RX1), and second elements of angular tilting (22, 26) adapted for tilting the second reflecting optical elements (M-X2, M-XY2) according to a second rotation angle (RX2), in such a way as to angularly tilt the axis (12) of the optical beam (2) by pivoting about the center (O) of the pupil of the microscope objective (1).

Abstract: An optical beam scanning microscopy apparatus includes a light source adapted to emit an optical beam (2) and a microscope objective (1) adapted for focusing the optical beam (2) in an object plane (11). The microscopy apparatus includes first and second reflecting optical elements (M-X1, M-X2) disposed in series on the optical path of the optical beam (2) between the light source and the microscope objective (1), first elements of angular tilting (21, 25) adapted for tilting the first reflecting optical elements (M-X1, M-XY1) according to a first predetermined rotation angle (RX1), and second elements of angular tilting (22, 26) adapted for tilting the second reflecting optical elements (M-X2, M-XY2) according to a second rotation angle (RX2), in such a way as to angularly tilt the axis (12) of the optical beam (2) by pivoting about the center (O) of the pupil of the microscope objective (1).

Abstract: An optical apparatus for Raman scattering microscopy, includes a laser source (10) suitable for emitting a laser beam (11) at an excitation wavelength ?, a microscope objective (14) suitable for receiving the laser beam (11) and focusing the laser beam in an image plane of the microscope objective (14), the focused laser beam (21) being intended to illuminate a sample (20), an optical system suitable for collecting a Raman scattering optical beam (22), and detection elements (16, 17) suitable for detecting the Raman scattering beam (22) collected. More particularly, the Raman scattering microscopy apparatus further includes an adaptive optics system (31, 32, 33) positioned on an optical path of the excitation laser beam (11), on an optical path of the Raman scattering beam (22) or on an optical path common to the excitation laser beam (11) and the Raman scattering beam (22).

Abstract: A device and a method for spectroscopic measurement of the spectrum of a light beam. The method includes detecting the dispersed light fluxes of the beam on an imaging device comprising a matrix of photodetectors with active columns, directing the imaging device so that one wavelength is allocated to a line of photodetectors, determining for each light flux the exposure time ?i necessary to measure a maximal intensity Imax and the sub-matrix Mi of photodetectors associated with the light fluxes, allocating to the sub-matrix Mi of photodetectors an exposure time ??i so that ??i is the largest integer divider of the total integration time T smaller than ?i, measuring and resetting, during the integration time T of said spectrum, at each time ??i, the corresponding sub-matrix Mi independently of the other sub-matrices Mj with j?i, and measuring the spectrum of the beam at the time T.

Abstract: This invention concerns a plasma source emission spectrometer to measure a sample comprising an excitation source (2) having a central axis (3) and producing a plasma, an extraction enclosure (4) receiving a beam composed of ions, atoms and electrons (5) derived from the plasma and comprising an optical lens (10) collecting luminous radiations emitted by the ion beam (5). According to the invention, the lens (10) is not exposed directly to the plasma. The invention also concerns a sighting device (100) comprising a metallic structure (13), substantially cylindrical having a first (15) and second (16) faces ranging respectively in a first (17) and second (18) planes. The first face (15) comprises an input aperture (20) for a beam (5) to be analysed and the second face (16) comprises an output aperture (28) for said beam (5). The first plane (17) forms an angle ? with the normal of the second plane (18).

Abstract: The invention relates to a device and a method for spectroscopic measurement of the spectrum of a light beam. According to the method, one detects the dispersed light fluxes of said beam on an imaging device comprising a matrix of photodetectors (23) with active columns (11). According to the invention, said imaging device (10) is directed so that one wavelength is allocated to a line (27) of photodetectors (12). One determines for each light flux (i=1, 2, . . . , n) the exposure time ?i necessary to measure a maximal intensity Imax and the sub-matrix Mi (13, 24-26) of photodetectors (12) associated with said light fluxes. One allocates to the sub-matrix Mi (13, 24-26) of photodetectors an exposure time ?!i so that ??i is the largest integer divider of the total integration time T smaller than ?i. During the integration time T of said spectrum, one measures and one resets, at each time ??i with i=(1, 2, . . .

Abstract: This invention concerns a plasma source emission spectrometer to measure a sample comprising an excitation source (2) having a central axis (3) and producing a plasma, an extraction enclosure (4) receiving a beam composed of ions, atoms and electrons (5) derived from the plasma and comprising an optical lens (10) collecting luminous radiations emitted by the ion beam (5). According to the invention, the lens (10) is not exposed directly to the plasma. The invention also concerns a sighting device (100) comprising a metallic structure (13), substantially cylindrical having a first (15) and second (16) faces ranging respectively in a first (17) and second (18) planes. The first face (15) comprises an input aperture (20) for a beam (5) to be analysed and the second face (16) comprises an output aperture (28) for said beam (5). The first plane (17) forms an angle &agr; with the normal of the second plane (18).