Abstract: The invention relates to a method for producing a slotted guide, in which: a) a layer of a material having a refractive index less than that of silicon, for example Material having a refractive index less than that of silicon (26), is formed on an etching barrier layer (22), b) two parallel trenches are etched into said material having a refractive index less than that of silicon, with the etching barrier on said etching barrier layer, these two trenches being separated by a wall of said material having a refractive index less than that of silicon (36), c) the trenches thus made are filled with silicon (42, 44).

Abstract: The invention relates to a method for producing a slotted guide, in which: a) a layer of material having a refractive index less than that of silicon is formed on a first silicon layer which itself rests on a silica SiO2 layer, then: b) a second silicon layer is formed on the layer of material having a refractive index less than that of silicon, this second layer forming a stack with the layer of material having a refractive index less than that of silicon and the first silicon layer, the layer of material having a refractive index less than that of silicon being contained between said two silicon layers; c) this stack is etched, the silica layer SiO2 forming the barrier layer for this etching.

Abstract: The invention relates to a method for producing a slotted guide, in which: a) a layer of a material having a refractive index less than that of silicon, for example Material having a refractive index less than that of silicon (26), is formed on an etching barrier layer (22), b) two parallel trenches are etched into said material having a refractive index less than that of silicon, with the etching barrier on said etching barrier layer, these two trenches being separated by a wall of said material having a refractive index less than that of silicon (36), c) the trenches thus made are filled with silicon (42, 44).