Abstract: A process for processing or forming a material by electromagnetic radiation and in a controlled atmosphere or in a vacuum inside a reaction chamber uses a first infrared radiation causing rapid heating and a second ultraviolet radiation of the excimer type having a spectral resolution lower than 40 nm, regardless of the wavelength of the ultraviolet radiation, so as to generate a suitable photon flux either for modification of the physico-chemical properties of the material or for formation of a deposit on the substrate. The exposure time of the second ultraviolet radiation is lower than that of the first infrared radiation and the processing temperature is comprised between 70° C. and 800° C. depending on the nature of the material and of the substrate.