Abstract: A structure for enhancing condensation and wetting dynamics includes a substrate and a channel formed in the substrate, forming fins. The fins have a hydrophilic surface. Each of the fins has a portion furthest from the substrate. A hydrophobic coating is formed over only the portion furthest from the substrate on each of the fins.

Abstract: Dual loop strain gauge architectures (or other multiple loop strain gauge architectures) are used to sense an amount of force applied to an electronic device. The force may be applied by a transverse, uneven pressure field, such as a force that is applied by an amorphous object and/or a force that is applied non-uniformly, over a large area and/or to multiple points or areas. In some embodiments, a dual loop (or other multiple loop) strain gauge architecture is used to sense a pressure distribution on an electronic device. In some embodiments, a single loop strain gauge architecture is used to sense an amount of force applied to an electronic device.

Abstract: A structure for enhancing condensation and wetting dynamics includes a substrate and a plurality of grooves formed in the substrate, forming fins. The fins having fin tops and a coating is applied over the fin tops.