Emyr Phillips has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: New N-substituted compounds, useful as metal deactivators in functional fluids, have the formula I: ##STR1## in which R.sub.1 and R.sub.2 are the same or different and each is C.sub. -C.sub.20 alkyl, C.sub.3 -C.sub.20 alkenyl, C.sub.5 -C.sub.12 cycloalkyl, C.sub.7 -C.sub.13 aralkyl, C.sub.6 -C.sub.10 aryl, or R.sub.1 and R.sub.2, together with the nitrogen atom to which they are each attached form a 5-, 6- or 7-membered heterocyclic residue, or R.sub.1 and R.sub.2 is each a residue of formula II:R.sub.3 X[(alkylene)O].sub.n (alkylene)-- IIin which X is O, S or N, R.sub.3 is hydrogen or C.sub.1 -C.sub.20 alkyl, alkylene is a C.sub.1 -C.sub.12 alkylene residue and n is 0 or an integer from 1 to 6, or R.sub.1 has its previous significance and R.sub.2 is a residue of formula III: ##STR2## or R.sub.2 is a residue of formula III as defined above R.sub.1 is a residue of formula IV:--[alkylene].sub.n --N(R.sub.4)--A--[N(R.sub.4).sub.2 ].sub.
Abstract: New anticorrosive compositions comprise:(A) an applicational medium selected from (a) surface coatings and (b) wholly or partly aqueous non-coating media,(B) as corrosion inhibitor, an amide, imide or nitrile of an aliphatic- or cycloaliphatic mono-, di-, tri- or tetra-carboxylic acid which is substituted in the aliphatic- or cycloaliphatic residue by one or more groups having the formula: ##STR1## in which X is oxygen, sulphur or NH; and each R, independently, is hydrogen, alkyl, haloalkyl, alkoxy, alkylthio, alkylsulphonyl, cycloalkyl, phenyl, alkylphenyl, phenylalkyl, halogen, cyano, nitro, hydroxy, --COOH, --COOalkyl or a primary-, secondary- or tertiary amino- or carbamoyl group; or a non-toxic base addition salts of those components (B) which contain free carboxyl groups.
Abstract: Process for the absorption of hydrogen sulphide impurity from gases or liquid hydrocarbons comprising:(a) washing the gas or liquid hydrocarbon containing hydrogen sulphide with an aqueous alkaline solution of(a1) one or more compounds having the formula: ##STR1## or a water-soluble salt thereof, wherein m is 0 or 1 and R is a hydrogen atom or a methyl or carboxy group, and(a2) one or more compounds of a metal capable of existing in at least two valency states;(b) removing sulphur formed by oxidation of hydrogen sulphide; and(c) re-oxidizing the hydroquinone formed from reduction of the compound of formula I.
Abstract: Salts having the formula:Y--NH.sub.3.sup.+.RCO.sub.2.sup.- Iin which Y is a group of formula R.sup.1 XCH.sub.2 CH(OH)CH.sub.2 --, R and R.sup.1 are the same or different and each is a straight- or branched chain alkyl group having from 1 to 18 carbon atoms, a straight- or branched chain alkenyl group having from 2 to 18 atoms, a cycloalkyl group having from 4 to 12 ring atoms, an aryl group having 6-10 ring atoms, or an aralkyl group having from 7 to 10 carbon atoms; and X is O, CO.sub.2, NR.sup.2 or S and R.sup.2 is hydrogen, a straight- or branched chain alkyl group having from 1 to 18 carbon atoms or an alkenyl group having from 2 to 18 C atoms.
Abstract: Compounds having the general formula: ##STR1## where A is a C.sub.1 -C.sub.4 straight or branched chain alkylene radical, B is a --SO.sub.3 M, --CO.sub.2 M, --PO.sub.3 HM or --PO.sub.3 M.sub.2 grouping,M is hydrogen, or a cation giving a water-soluble derivative,R is hydrogen, a cation giving a water-soluble derivative or a C.sub.1 -C.sub.4 straight or branched alkyl, R.sub.1 is hydrogen, methyl or --COOH, and m is 0 or 1 and processes of preparing them.
Abstract: Processes for the absorption and subsequent removal as sulphur of hydrogen sulphide from gases, gas mixtures and liquid hydrocarbons in which the material containing hydrogen sulphide is washed with an aqueous alkaline solution containing one or more compounds having the general formula: ##STR1## where A is a C.sub.1 -C.sub.4 straight or branched chain alkylene radical,B is a --SO.sub.3 M, --CO.sub.2 M, --PO.sub.3 HM or --PO.sub.3 M.sub.2 grouping, whereM is hydrogen, or a cation giving a water-soluble derivative,R is hydrogen, a cation giving a water-soluble derivative, or C.sub.1 -C.sub.4 straight or branched alkyl,R.sub.