Patents by Inventor En Kuang Wang

En Kuang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TIN OXIDE FILM AND MANUFACTURING METHOD OF THE SAME
    Publication number: 20150328659
    Abstract: A low-haze tin oxide film and a manufacturing method thereof are provided. The method includes: applying a mixed solution on a substrate and heating the substrate to form a tin oxide film. The mixed solution contains a tin source, an oxidizing agent, and a solvent.
    Type: Application
    Filed: December 28, 2012
    Publication date: November 19, 2015
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Chun CHEN, Chin-Ching LIN, En-Kuang WANG, Mei-Ching CHIANG, Yi-Chen CHEN, Hung-Chou LIAO
  • Superabsorbent polymers
    Patent number: 9109059
    Abstract: A superabsorbent polymer network formed of two monomers and two crosslinkers. The monomers and the crosslinkers are described herein. Further, a method for preparing this superabsorbent polymer network is disclosed. Also disclosed is a method of determining a ratio between two monomeric moieties in a superabsorbent polymer network formed of two monomers.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: August 18, 2015
    Assignee: Industrial Technology Research Institute
    Inventors: Tun-Fun Way, Kelly Teng, En-Kuang Wang, Yu-Ting Chen, Jiun-Jy Chen
  • Patterning process for oxide film
    Patent number: 8906247
    Abstract: The present disclosure provides a patterning process for an oxide film, including: covering a barrier layer composition on a substrate to form a patterned barrier layer, wherein the barrier layer composition includes an inorganic component and an organic binder with a weight ratio of 50-98:2-50; forming an oxide film on the patterned barrier layer and the substrate, wherein a thickness ratio (D1/D2) of the barrier layer (D1) to the oxide film (D2) is about 5-2000; and lifting off the barrier layer and the oxide film thereon, while leaving portions of the oxide film on the substrate.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: December 9, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Ching Lin, Yu-Chun Chen, En-Kuang Wang, Mei-Ching Chiang, Yi-Chen Chen
  • PATTERNING PROCESS FOR OXIDE FILM
    Publication number: 20140034605
    Abstract: The present disclosure provides a patterning process for an oxide film, including: covering a barrier layer composition on a substrate to form a patterned barrier layer, wherein the barrier layer composition includes an inorganic component and an organic binder with a weight ratio of 50-98:2-50; forming an oxide film on the patterned barrier layer and the substrate, wherein a thickness ratio (D1/D2) of the barrier layer (D1) to the oxide film (D2) is about 5-2000; and lifting off the barrier layer and the oxide film thereon, while leaving portions of the oxide film on the substrate.
    Type: Application
    Filed: July 15, 2013
    Publication date: February 6, 2014
    Inventors: Chin-Ching LIN, Yu-Chun CHEN, En-Kuang WANG, Mei-Ching CHIANG, Yi-Chen CHEN
  • Filtration material
    Patent number: 8567611
    Abstract: The invention discloses a filtration material for desalination, including a support layer, and a desalination layer formed on the support layer, wherein the desalination layer is a fiber composite membrane and includes at least one water-swellable polymer. The water-swellable polymer is made of hydrophilic monomers and hydrophobic monomers, and the hydrophilic monomers include ionic monomers and non-ionic monomers, and the ionic monomers include cationic monomers and anionic monomers.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: October 29, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Shu-Hui Cheng, Jong-Pyng Chen, En Kuang Wang, Yi-Chun Lo, Shan-Shan Lin
  • FILTRATION MATERIAL FOR DESALINATION
    Publication number: 20110210064
    Abstract: The invention discloses a filtration material for desalination, including a support layer, and a desalination layer formed on the support layer, wherein the desalination layer is a fiber composite membrane and includes at least one water-swellable polymer. The water-swellable polymer is made of hydrophilic monomers and hydrophobic monomers, and the hydrophilic monomers include ionic monomers and non-ionic monomers, and the ionic monomers include cationic monomers and anionic monomers.
    Type: Application
    Filed: December 21, 2010
    Publication date: September 1, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shu-Hui Cheng, Jong-Pyng Chen, En Kuang Wang, Yi-Chun Lo, Shan-Shan Lin