Abstract: Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.

Abstract: Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.

Abstract: The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first conductive mesh may receive a first electrical signal and the second conductive mesh may receive a second electrical signal such that the first and second conductive meshes are oppositely charged from each other (e.g., the first conductive mesh is positively charged and the second conductive mesh is negatively charged). Anions that are present within the fluid or generated by an electrical field between the first and second conductive meshes may interact with the contaminants such that the contaminants are attracted to at least one of the first and second conductive meshes, respectively.

Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.

Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.

Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.

Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.

Abstract: The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH4+) ions in the liquid; desorbing the plurality of NH4+ ions to a solution; converting a fraction of the plurality of NH4+ ions into a plurality of ammonia (NH3) molecules; andelectrolyzing the plurality of NH3 molecules to become a plurality of hydrogen (H2) molecules and a plurality of nitrogen (N2) molecules.

Abstract: A method for determining the concentration of a compound in ultrapure water is provided. The method includes dividing the ultrapure water into a first part and a second part and decomposing the compound in the first part, so that the first part includes a characteristic substance. The method also includes measuring a first concentration of the characteristic substance in the first part and a second concentration of the characteristic substance in the second part and calculating the difference between the first concentration and the second concentration. The method further includes obtaining the concentration of the compound in the ultrapure water based on the difference.

Abstract: The present disclosure is directed to various methods and systems for monitoring real time efficiency of filters as well as testing the filters with tests that are similar to real world use of the filters to update technical specifications of the filters. The methods and systems monitoring the real time efficiency of the filters may utilize one or more particle counters to monitor their efficiency in real time. The data collected by the particle counters may be utilized to determine whether respective ones of the filters need to be replaced or regenerated by a backwash regeneration process. The updated technical specifications from the real world testing of the filters may be utilized in determining whether respective ones of the filters need to be replaced or regenerated. These real world testing and real time monitoring reduces the likelihood that workpieces are exposed to contaminant particles reducing scrap costs.

Abstract: The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first conductive mesh may receive a first electrical signal and the second conductive mesh may receive a second electrical signal such that the first and second conductive meshes are oppositely charged from each other (e.g., the first conductive mesh is positively charged and the second conductive mesh is negatively charged). Anions that are present within the fluid or generated by an electrical field between the first and second conductive meshes may interact with the contaminants such that the contaminants are attracted to at least one of the first and second conductive meshes, respectively.

Abstract: A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.

Abstract: A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.

Abstract: Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.

Abstract: A method for processing a substrate by using fluid flowing through a particle detector is provided. The particle detector is utilized to detect nano-particles contained in fluid. The particle detector includes a substrate and a pair of sensing electrodes disposed on the substrate. The substrate includes nano-pores, wherein the pore size of the nano-pores is greater than the particle size of the nano-particles, allowing the nano-particles contained in the fluid passing through the nano-pores. The pair of sensing electrodes are positioned adjacent to at least one of the nano-pores.

Abstract: A method for making a filter membrane includes: forming a polymer layer; applying a plurality of nanoparticles on the polymer layer, the nanoparticles being self-assembled to form a closed pack arrangement on the polymer layer; heating the nanoparticles such that a portion of the polymer layer contacting the nanoparticles is softened so that the nanoparticles are sunk into the polymer layer; and removing the nanoparticles from the polymer layer so that the polymer layer is formed with a plurality of pores penetrating the polymer layer and being arranged in a honeycomb pattern.

Abstract: The present disclosure provides a measuring system. The measuring system includes an insulative tube, a capacitor and a static charge meter. The insulative tube is configured to allow a fluid to flow therethrough. The capacitor is disposed on a surface of a section of the insulative tube. The capacitor includes a first metallic layer, a second metallic layer opposite to the first metallic layer, and a dielectric layer sandwiched between the first metallic layer and the second metallic layer. The static charge meter is electrically coupled to the capacitor and configured to measure static charge accumulated inside the section of the insulative tube.

Abstract: A system and a method for testing a filter used in ultrapure water are provided. The method for testing a filter, which is used for removing particles from ultrapure water, comprises: providing a testing solution with particles; detecting the particles in the testing solution by a particle counter; passing the testing solution through a filter; and detecting the particles in the testing solution, which is passed through the filter, by another particle counter.

Abstract: A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.

Abstract: A method for processing a substrate by using fluid flowing through a particle detector is provided. The particle detector is utilized to detect nano-particles contained in fluid. The particle detector includes a substrate and a pair of sensing electrodes disposed on the substrate. The substrate includes nano-pores, wherein the pore size of the nano-pores is greater than the particle size of the nano-particles, allowing the nano-particles contained in the fluid passing through the nano-pores. The pair of sensing electrodes are positioned adjacent to at least one of the nano-pores.