Abstract: A chemical solution coating apparatus, having a carrier board and a plurality of spray apparatuses. The carrier board is to carry the wafer to be coated, and the spray apparatuses are located at a periphery of the carrier board to evenly spray chemical solution on the wafer. Since the chemical solution is coated on the wafer in a spray manner, so that the unnecessary lapse and process cost are avoided. The number and spraying angle spray apparatuses can be adjusted to reach an optimum status.

Abstract: A dispensing system used in a spin coater is provided to transport a solvent to a wafer. The dispensing, system includes a switch valve, a sucking-back valve, a solenoid valve, a speed control unit of the sucking-back valve, and a speed control unit of the switch valve. The switch valve controls a solvent dispensing status. The sucking-back valve receives the solvent from the switch valve and exports the solvent to a wafer. The solenoid valve controls the switch valve and the sucking-back valve. The speed control unit of the switch valve is coupled between the switch valve and the solenoid valve and is used for a control of action speed on the switch valve. The speed control unit of the sucking-back valve is coupled between the switch valve and the sucking-back valve, and is used for a control of action speed of the sucking-back valve by a sufficient delay time of action.

Abstract: A photoresist dispensing system used in a photoresist coating machine includes a pump, a sucking-back valve, a solenoid valve, a first pump speed controller, a second pump speed controller and a sucking-back speed controller. The pump is used to transport photoresist and spray a substrate. The sucking-back valve is used to suck back liquid photoresist from a transporting duct end. The solenoid is used to activate or inactivate the pump and the sucking-back valve. The first and the second pump speed controllers are separately coupled between the pump and the solenoid valve, and the sucking-back speed controller is coupled between the sucking-back valve and the sucking-back speed controller is coupled between the sucking-back valve and the route, where is between the pump and the second pump speed controller. Hence, the sucking-back valve produces a sucking force after the pump is inactivated and releases a sucking force after pump is activated.

Abstract: A SOG coater nozzle pot includes a pot for containing fluid and letting the fluid in the pot flow out, a funneled nozzle including a wider opening for receiving fluid from the pot and a narrower opening on a protuberance inserted into a duct, and a mounting device for mounting the funneled nozzle on the SOG coater. The nozzle pot according to the invention makes the mounting/dismounting operations of the pot more convenient and less time-consuming. The stability of the SOG coater is maintained as well.

Abstract: The present invention discloses a stepper vacuum chuck wiper for cleaning a stepper vacuum chuck, which includes a rod frame, a bearing device, a flare type soft shield, a wiping stick and an illuminating device. The rod frame has a through hole at one end and the bearing device is sleeved inside of the through hole. The flare type soft shield with a flare opening on its lower end is sleeved inside the bearing device, and the diameter of the flare opening is larger than the outside diameter of the bearing device. The wiping stick is sleeved inside the flare type soft shield. The illuminating device for illuminating the stepper vacuum chuck includes a light source, a battery set and a switch. The battery set is coupled to the other end of the rod frame to provide electricity to the light source, and the switch is coupled between the battery set and the light source to control the illumination of the light source, wherein the light source and the switch are disposed on the rod frame.