Patents by Inventor Eng H. Lim

Eng H. Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual-hybrid liner formation without exposing silicide layer to photoresist stripping chemicals
    Patent number: 7396724
    Abstract: Methods of fabricating a semiconductor device including a dual-hybrid liner in which an underlying silicide layer is protected from photoresist stripping chemicals by using a hard mask as a pattern during etching, rather than using a photoresist. The hard mask prevents exposure of a silicide layer to photoresist stripping chemicals and provides very good lateral dimension control such that the two nitride liners are well aligned.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: July 8, 2008
    Assignees: International Business Machines Corporation, Chartered Semiconductor Manufacturing Ltd.
    Inventors: Victor Chan, Haining S. Yang, Yong M. Lee, Eng H. Lim