Patents by Inventor Eng Lim

Eng Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7451541
    Abstract: A protective sheath for a fluid-carrying tube is made from a larger tube cut into longitudinal tube segments and slice into opposed halves before being re-secured together about the fluid-carrying tube. Slip joints are preferably provided between adjoining outer tube segments.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: November 18, 2008
    Assignee: Pratt & Whitney Canada Corp.
    Inventors: Honza Stastny, Eng Lim
  • Publication number: 20070275037
    Abstract: The invention provides an expression vector for expression of recombinant vitellogenin in an eukaryotic host. An eukaryotic host, including yeast comprising the expression vector according to the invention may be used as a feed or feed additive for both oviparous and non-oviparous animals, including domesticated animals. A transgenic yeast according to the invention contain increased levels of essential amino acids and fatty acids and may be used as a direct feed or fed to an intermediate live feed such as rotifers or artemias to increase the survival rates of oviparous animal or broodstock.
    Type: Application
    Filed: November 11, 2003
    Publication date: November 29, 2007
    Inventors: Jeak Ding, Eng Lim, Toong Lam
  • Publication number: 20070138564
    Abstract: A method for forming a device with both PFET and NFET transistors using a PFET compressive etch stop liner and a NFET tensile etch stop liner and two anneals in a deuterium containing atmosphere. The method comprises: providing a NFET transistor in a NFET region and a PFET transistor in a PFET region. We form a NFET tensile contact etch-stop liner over the NFET region. Then we perform a first deuterium anneal. We form a PFET compressive etch stop liner over the PFET region. We form a (ILD) dielectric layer with contact openings over the substrate. We perform a second deuterium anneal. The temperature of the second deuterium anneal is less than the temperature of the first deuterium anneal.
    Type: Application
    Filed: December 15, 2005
    Publication date: June 21, 2007
    Inventors: Khee Lim, Victor Chan, Eng Lim, Wenhe Lin, Jamin Fen
  • Publication number: 20070124832
    Abstract: We describe glycosyltransferase nucleic acids and proteins, transgenic cells expressing said glycosyltransferases and bioreactors comprising said transgenic cells.
    Type: Application
    Filed: May 24, 2004
    Publication date: May 31, 2007
    Applicant: THE UNIVERSITY OF YORK
    Inventors: Eng Lim, Dianna Bowles
  • Publication number: 20070101058
    Abstract: A storage unit comprising a plurality of storage devices and a user input/output (“I/O”) device coupled to the plurality of storage devices and adapted for exclusive use with the storage unit. The I/O device is used to create a Redundant Array of Independent Disks (“RAID”) configuration. The plurality of storage devices are configured in accordance with the RAID configuration.
    Type: Application
    Filed: October 27, 2005
    Publication date: May 3, 2007
    Inventors: Keith Kinnan, Brian Corell, Michael Myrah, William Kilcoyne, Eng Lim
  • Publication number: 20070049744
    Abstract: We describe transgenic cells which are transformed with nucleic acid molecules which encode glucosyltransferase polypeptides involved in phenylpropanoid biosynthesis.
    Type: Application
    Filed: October 12, 2004
    Publication date: March 1, 2007
    Inventors: Dianna Bowles, Rosamond Jackson, Eng Lim, Fabian Vaistij
  • Publication number: 20070004538
    Abstract: A golf tee comprising a shaft, a stopper portion disposed at an upper end of the shaft and a pivotable support portion mounted atop the upper end of the shaft is described. The shaft is adapted for insertion into a surface of ground. The support portion has a plurality of prong members mounted upon an upper horizontal surface thereof. The position of the support portion can be adjusted so that the upper surface of the support portion is arranged in parallel horizontal alignment with the ground surface. The prong members are adapted to support a golf ball placed thereupon.
    Type: Application
    Filed: September 5, 2003
    Publication date: January 4, 2007
    Inventor: Eng Lim
  • Publication number: 20060228836
    Abstract: A method for manufacturing a device includes mapping extreme vertical boundary conditions of a mask layer based on vertical edges of a deposited first layer and a second layer. The mask layer is deposited over portions of the second layer based on the mapping step. The exposed area of the second layer is etched to form a smooth boundary between the first layer and the second layer. The resist layer is stripped. The resulting device is an improved PFET device and NFET device with a smooth boundary between the first and second layers such that a contact can be formed at the smooth boundary without over etching other areas of the device.
    Type: Application
    Filed: April 12, 2005
    Publication date: October 12, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Haining Yang, Eng Lim
  • Publication number: 20060228848
    Abstract: Methods of fabricating a semiconductor device including a dual-hybrid liner in which an underlying silicide layer is protected from photoresist stripping chemicals by using a hard mask as a pattern during etching, rather than using a photoresist. The hard mask prevents exposure of a silicide layer to photoresist stripping chemicals and provides very good lateral dimension control such that the two nitride liners are well aligned.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 12, 2006
    Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, Chartered Semiconductor Manufacturing LTD
    Inventors: Victor Chan, Haining Yang, Yong Lee, Eng Lim
  • Publication number: 20060174962
    Abstract: A protective sheath for a fluid-carrying tube is made from a larger tube cut into longitudinal tube segments and slice into opposed halves before being re-secured together about the fluid-carrying tube. Slip joints are preferably provided between adjoining outer tube segments.
    Type: Application
    Filed: February 4, 2005
    Publication date: August 10, 2006
    Inventors: Honza Stastny, Eng Lim
  • Publication number: 20060127959
    Abstract: Purified antibodies that bind to M. tuberculosis ERP protein are disclosed. In one a embodiment, a purified antibody, which binds specifically with a polypeptide comprising SEQ ID NO: 39 or SEQ ID NO: 41 is provided. In some embodiments the polypeptide has a theoretical molecular weight of about 28 kDa. In other embodiments the polypeptide has an observed molecular weight of about 36 kDa, as determined by denaturing polyacrylamide gel electrophoresis (SDS-PAGE). The purified antibody may be a monoclonal or a polyclonal antibody. Further embodiments provide antibodies that does not bind specifically with M. teprae P28 protein. The antibodies of the invention have many uses including the identification of M. tuberculosis.
    Type: Application
    Filed: January 15, 2003
    Publication date: June 15, 2006
    Applicant: Institut Pasteur
    Inventors: Brigitte Gicquel, Eng Lim, Denis Portnoi, Francois-Xavier Berthet, Juliano Timm
  • Publication number: 20060079046
    Abstract: A method for improving hot carrier effects in complementary metal oxide semiconductor (CMOS) devices includes forming a first configuration of insulating material over a first group of the CMOS devices, and forming a second configuration of insulating material over a second group of the CMOS devices. The first and said second configurations of insulating material are formed subsequent to a silicidation of the CMOS devices and prior to formation of a first interlevel (ILD) dielectric material over the CMOS devices.
    Type: Application
    Filed: October 12, 2004
    Publication date: April 13, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Haining Yang, Eng Lim
  • Publication number: 20050225104
    Abstract: A system (1) for handling containers, the system (1) comprising: a) a mounting frame (3); b) a rotation device (4) attached to the mounting frame (3); c) a spreader 5 having a main axis and being supported by the rotation device (4), the rotation device (4) being operative to rotate the spreader (5) relative to the mounting frame (3); and d) two extension devices (30, 31), each extension device (30, 31) having a longitudinal axis and adapted for connection to a container (2) a having a length direction parallel to the longitudinal axis; the spreader (5) including inner pickup elements (9a, 9b, 10a, 10b) and outer pickup elements (33a, 33b, 34a, 34b) for releasably connecting the spreader to the extension devices (30, 31) with the extension devices (30, 31) side-by-side and the main axis of the spreader (5) transverse to the longitudinal axis of both the extension devices (30, 31).
    Type: Application
    Filed: May 10, 2002
    Publication date: October 13, 2005
    Applicant: NatSteel Engineering PTE LTD.
    Inventors: Eng Lim, Robert Mills
  • Publication number: 20050089777
    Abstract: A method of forming small features, comprising the following steps. A substrate having a dielectric layer formed thereover is provided. A spacing layer is formed over the dielectric layer. The spacing layer has a thickness equal to the thickness of the small feature to be formed. A patterned, re-flowable masking layer is formed over the spacing layer. The masking layer having a first opening with a width “L”. The patterned, re-flowable masking layer is re-flowed to form a patterned, re-flowed masking layer having a re-flowed first opening with a lower width “l”. The re-flowed first opening lower width “l” being less than the pre-re-flowed first opening width “L”. The spacing layer is etched down to the dielectric layer using the patterned, re-flowed masking layer as a mask to form a second opening within the etched spacing layer having a width equal to the re-flowed first opening lower width “l”. Removing the patterned, re-flowed masking layer.
    Type: Application
    Filed: November 12, 2004
    Publication date: April 28, 2005
    Inventors: Chew-Hoe Ang, Eng Lim, Randall Cha, Jia-Zhen Zheng, Elgin Quek, Mei-Sheng Zhou, Daniel Yen
  • Patent number: D671436
    Type: Grant
    Filed: June 11, 2012
    Date of Patent: November 27, 2012
    Inventors: Ji Hyung Yu, Eng Lim