Abstract: A method for placement of a object such as a substrate or a mask on a table, said method including: a first placement step in which the object is placed on a first position on the table; a measuring step in which a displacement between the first position of the object and the required position of the object is determined; a removing step in which the object is released and removed from the table; a moving step in which the object and the table are moved relatively to each other by substantially the said displacement, in a direction substantially parallel to the surface of the table; and a second placement step in which the object is placed at the required position on the table.

Abstract: An optomechanical mounting includes an upper spring assembly and a lower spring assembly that support and secure a sphere containing an optical element. The materials in the mounting have the same or nearly the same CTEs and spring assemblies provide opposing radial forces so that thermal expansions are compensated, giving the mounting superior thermal stability. Frictional forces on the sphere from the upper and lower spring assemblies maintain the orientation of the sphere (and the optical element) during operation, but smooth surfaces of the sphere and springs still permit sensitive, precision rotation of sphere for alignment without post-alignment clamping of the sphere. The spring assemblies can be ring-shaped to permit an opening through the spring assembly to the sphere for light paths or for tools that adjust the alignment of the sphere.

Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.

Abstract: A lithographic projection apparatus is disclosed. The lithographic projection apparatus includes an illumination system to supply a projection beam of radiation, a first object table to hold a mask, a second object table provided with a support surface to support and hold a substrate at its backside surface and a projection system to image an irradiated portion of the mask onto a target portion of the substrate including a detector constructed and arranged to detect the presence of contamination on one or both of the support surface and the substrate backside surface.

Abstract: A method for placement of a object such as a substrate or a mask on a table, said method including:

Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.