Patents by Inventor Engelbertus Antonius F. Van De Pasch

Engelbertus Antonius F. Van De Pasch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Enhanced lithographic displacement measurement system
    Patent number: 6987557
    Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: January 17, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Onno Pril, Engelbertus Antonius F. Van De Pasch, Robert F. Dillon, Philip Dennis Henshaw
  • Enhanced lithographic displacement measurement system
    Patent number: 6958807
    Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: October 25, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Onno Pril, Engelbertus Antonius F. Van De Pasch, Robert F. Dillon, Philip Dennis Henshaw
  • Enhanced lithographic displacement measurement system
    Publication number: 20040169837
    Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
    Type: Application
    Filed: November 24, 2003
    Publication date: September 2, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Onno Pril, Engelbertus Antonius F. Van De Pasch, Robert F. Dillon, Philip Dennis Henshaw