Patents by Inventor Enno Van Den Brink
Enno Van Den Brink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10705438Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: December 17, 2019Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Publication number: 20200117097Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: ApplicationFiled: December 17, 2019Publication date: April 16, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Patent number: 10571814Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: June 29, 2017Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Publication number: 20190235392Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: ApplicationFiled: June 29, 2017Publication date: August 1, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus VAN BOKHOVEN, Stan Henricus VAN DER MEULEN, Yang-Shan HUANG, Federico LA TORRE, Barry MOEST, Stefan Carolus Jacobus Antonius KEIJ, Enno VAN DEN BRINK, Christine Henriette SCHOUTEN, Hoite Pieter Theodoor TOLSMA
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Patent number: 7844131Abstract: A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.Type: GrantFiled: August 24, 2006Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Melle Cornelis Geers, Enno Van Den Brink, Eric Maria Geelink
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Patent number: 7675606Abstract: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.Type: GrantFiled: May 5, 2006Date of Patent: March 9, 2010Assignee: ASML Netherlands B.V.Inventors: Enno Van Den Brink, Henricus Wilhelmus Maria Van Buel, Joseph Consolini, Gerardus Johannes Joseph Keijsers, Klaus Simon, Johannes Theodoor De Smit, Richard Joseph Travers, Maurice Anton Jaques Teuwen, Arnout Johannes Meester, Frederick William Hafner, Vinyu Greenlee, Hubertus Antonius Marinus Baijens
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Patent number: 7570342Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.Type: GrantFiled: December 6, 2005Date of Patent: August 4, 2009Assignee: ASML Netherlands B.V.Inventors: Klaus Simon, Enno Van Den Brink, Gerardus Johannes Joseph Keijsers, Adrianus Hubertus Henricus Van Dijk, Hubertus Antonius Marinus Baijens
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Patent number: 7567340Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.Type: GrantFiled: September 29, 2006Date of Patent: July 28, 2009Assignee: ASML Netherlands B.V.Inventors: Cheng-Qun Gui, Keith Frank Best, Enno Van Den Brink, Budiman Sutedja, Peter Ten Berge
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Patent number: 7562686Abstract: A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.Type: GrantFiled: December 27, 2005Date of Patent: July 21, 2009Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Geoffrey Norman Phillipps, Franciscus Godefridus Casper Bijnen, Enno Van Den Brink, Henricus Wilhelmus Maria Van Buel, Joseph J. Consolini, Peter Ten Berge
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Publication number: 20080085462Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.Type: ApplicationFiled: September 29, 2006Publication date: April 10, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Enno Van Den Brink, Cheng-Qun Gui, Budiman Sutedja, Peter Ten Berge
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Publication number: 20080050040Abstract: A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.Type: ApplicationFiled: August 24, 2006Publication date: February 28, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Melle Cornelis Geers, Enno Van Den Brink, Eric Maria Geelink
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Publication number: 20060146300Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.Type: ApplicationFiled: December 6, 2005Publication date: July 6, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Klaus Simon, Enno Van Den Brink, Gerardus Keijsers, Adrianus Van Dijk, Hubertus Baijens
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Publication number: 20030213921Abstract: To print layers of extended devices, that is devices extending over more than one target portion or die, a projection field is selected to minimize stitching errors. The selection of the projection field is based on data characterizing the projection lens to be used and the projection field is selected so as minimize the difference between positional errors in the projected image on opposite sides of the field.Type: ApplicationFiled: April 10, 2003Publication date: November 20, 2003Applicant: ASML NETHERLANDS, B.V.Inventors: Michael Josephus Evert Van De Moosdijk, Klaus Simon, Enno Van Den Brink