Patents by Inventor Enrico Benedetti

Enrico Benedetti has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8594277
    Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: November 26, 2013
    Assignee: Media Lario S.R.L.
    Inventors: Fabio Zocchi, Pietro Binda, Enrico Benedetti
  • Patent number: 8390785
    Abstract: A collector optical system is provided in which radiation is collected from a radiation source and directed to an image focus. The collector optical system includes one or more mirrors, with each mirror being symmetric about an optical axis extending through the radiation source and each mirror having at least first and second reflective surfaces. The first and second reflective surfaces have a common focus, such that radiation from the source undergoes successive grazing incidence reflections at the first and second reflective surface and wherein the common focus is transversely offset by a predetermined distance ?r with respect to the optical axis.
    Type: Grant
    Filed: September 3, 2007
    Date of Patent: March 5, 2013
    Assignee: Media Lario, S. R. L.
    Inventors: Fabio E. Zocchi, Pietro Binda, Enrico Benedetti
  • Publication number: 20110043779
    Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
    Type: Application
    Filed: January 28, 2009
    Publication date: February 24, 2011
    Inventors: Fabio Zocchi, Pietro Binda, Enrico Benedetti
  • Publication number: 20100096557
    Abstract: A collector optical system is provided in which radiation is collected from a radiation source and directed to an image focus. The collector optical system includes one or more mirrors, with each mirror being symmetric about an optical axis extending through the radiation source and each mirror having at least first and second reflective surfaces. The first and second reflective surfaces have a common focus, such that radiation from the source undergoes successive grazing incidence reflections at the first and second reflective surface and wherein the common focus is transversely offset by a predetermined distance ?r with respect to the optical axis.
    Type: Application
    Filed: September 3, 2007
    Publication date: April 22, 2010
    Inventors: Fabio E. Zocchi, Pietro Binda, Enrico Benedetti
  • Publication number: 20100091941
    Abstract: A reflective optical system, in which radiation from a radiation source is directed to an image focus or intermediate focus, including one or more mirrors (symmetric about the optical axis). Each mirror has at least first and second reflective surfaces, whereby radiation from the source undergoes successive grazing incidence reflections in an optical path at first and second reflective surfaces. The first and second reflective surfaces are formed such that the angles of incidence of the successive grazing incidence reflections at the first and second reflective surfaces are substantially equal. Each mirror may be formed as an electroformed monolithic component, wherein the first and second reflective surfaces are each provided on a respective one of two contiguous sections of the mirror. The reflective optical system may be embodied in a collector optical system for EUV lithography, or in an EUV or X-ray telescope or imaging optical system.
    Type: Application
    Filed: July 30, 2007
    Publication date: April 15, 2010
    Inventors: Fabio E. Zocchi, Enrico Benedetti