Patents by Inventor Enrico Mosca

Enrico Mosca has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for processing a substrate
    Patent number: 7419702
    Abstract: A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing can include providing a substrate to be processed on the coated ceramic substrate heater, performing a process on the substrate by exposing the substrate to a process gas, and removing the processed substrate from the process chamber.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: September 2, 2008
    Assignees: Tokyo Electron Limited, International Business Machines Corp.
    Inventors: Kazuhito Nakamura, Cory Wajda, Enrico Mosca, Yumiko Kawano, Gert Leusink, Fenton R. McFeely, Sandra G. Malhotra
  • Low-pressure deposition of ruthenium and rhenium metal layers from metal carbonyl precursors
    Publication number: 20060068588
    Abstract: A method for depositing Ru and Re metal layers on substrates with high deposition rates, low particulate contamination, and good step coverage on patterned substrates is presented. The method includes providing a substrate in a process chamber, introducing a process gas in the process chamber in which the process gas comprises a carrier gas and a metal precursor selected from the group consisting of a ruthenium-carbonyl precursor and a rhenium-carbonyl precursor. The method further includes depositing a Ru or Re metal layer on the substrate by a thermal chemical vapor deposition process at a process chamber pressure less than about 20 mTorr.
    Type: Application
    Filed: September 30, 2004
    Publication date: March 30, 2006
    Applicants: Tokyo Electron Limited, International Business Machines Corporation
    Inventors: Hideaki Yamasaki, Kenji Suzuki, Emmanuel Guidotti, Enrico Mosca, Gert Leusink, Yumiko Kawano, Fenton McFeely, Sandra Malhotra
  • Method for processing a substrate
    Publication number: 20050221002
    Abstract: A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing can include providing a substrate to be processed on the coated ceramic substrate heater, performing a process on the substrate by exposing the substrate to a process gas, and removing the processed substrate from the process chamber.
    Type: Application
    Filed: March 31, 2004
    Publication date: October 6, 2005
    Inventors: Kazuhito Nakamura, Cory Wajda, Enrico Mosca, Yumiko Kawano, Gert Leusink, Fenton McFeely, Sandra Malhotra