Patents by Inventor Enrico Rigon

Enrico Rigon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FEED SYSTEM FOR CRYSTAL GROWING SYSTEMS
    Publication number: 20180030614
    Abstract: A system for growing a crystal ingot from a melt includes a housing and a feed system. The housing defines a growth chamber and an ingot removal chamber positioned above the growth chamber. The feed system includes an enclosure, a feed material reservoir positioned within the enclosure, and a feed channel including an intake end and an outlet end. The intake end is configured to receive feed material from the feed material reservoir. The housing has an opening in communication with the removal chamber and a connector proximate the opening, and the enclosure has an opening and a connector configured to mate with the housing connector. The feed channel is moveable between a retracted position and an extended position in which the feed channel extends through the opening in the housing and the outlet end is positioned within the removal chamber.
    Type: Application
    Filed: February 12, 2015
    Publication date: February 1, 2018
    Inventors: Stephan Haringer, Gianni Dell'Amico, Marco D'Angella, Renzo Odorizzi, Maria Porrini, Enrico Rigon, Valentino Moser
  • Methods and systems for monitoring and controlling silicon rod temperature
    Patent number: 9115423
    Abstract: Systems and methods are disclosed for monitoring and controlling silicon rod temperature. One example is a method of monitoring a surface temperature of at least one silicon rod in a chemical vapor deposition (CVD) reactor during a CVD process. The method includes capturing an image of an interior of the CVD reactor. The image includes a silicon rod. The image is scanned to identify a left edge of the silicon rod and a right edge of the silicon rod. A target area is identified midway between the left edge and the right edge. A temperature of the silicon rod in the target area is determined.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: August 25, 2015
    Assignee: MEMC Electronic Materials S.p.A.
    Inventor: Enrico Rigon
  • Methods and Systems For Monitoring and Controlling Silicon Rod Temperature
    Publication number: 20130017139
    Abstract: Systems and methods are disclosed for monitoring and controlling silicon rod temperature. One example is a method of monitoring a surface temperature of at least one silicon rod in a chemical vapor deposition (CVD) reactor during a CVD process. The method includes capturing an image of an interior of the CVD reactor. The image includes a silicon rod. The image is scanned to identify a left edge of the silicon rod and a right edge of the silicon rod. A target area is identified midway between the left edge and the right edge. A temperature of the silicon rod in the target area is determined.
    Type: Application
    Filed: July 6, 2012
    Publication date: January 17, 2013
    Applicant: MEMC ELECTRONIC MATERIALS SPA
    Inventor: Enrico Rigon