Patents by Inventor Enxia WANG

Enxia WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230023458
    Abstract: A mask and a mask assembly, which relates to the display field. The mask includes an opening region, a welding region and a blocking groove, the welding region is arranged around the opening region, and the blocking groove is arranged outside the opening area. When the mask is welded to a frame, wrinkles will appear on the mask. In embodiments of the present application, by providing a blocking groove on the mask, the spreading of the wrinkles may be blocked by the blocking groove, thereby preventing the wrinkles from extending into the opening region of the mask, avoiding the position shifting of the opening region, and improving the evaporation accuracy.
    Type: Application
    Filed: September 30, 2022
    Publication date: January 26, 2023
    Applicant: HEFEI VISIONOX TECHNOLOGY CO., LTD.
    Inventors: Enxia WANG, Lin SUN, Shitai LI, Hui LI, Weili LI, Mingxing LIU, Shuaiyan GAN
  • Patent number: 11021784
    Abstract: The present disclosure relates to a method of a mask layout, including: providing a frame with preset areas arranged at intervals, a positioning area between two adjacent preset areas, and a fixed area provided to offset from the positioning area and each of the preset areas, and a distance between two adjacent preset areas being a first predetermined distance L1; providing a cover mask corresponding to the positioning area, and a distance between an edge of the cover mask and the center of the positioning area being a second predetermined distance L2; and providing an evaporation mask on the fixed area according to preset conditions, a distance between two adjacent fixed areas being a third predetermined distance L3, and the third predetermined distance L3 being equal to a difference between the first predetermined distance L1 and the second predetermined distance L2.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: June 1, 2021
    Assignee: YUNGU (GU'AN) TECHNOLOGY CO., LTD.
    Inventors: Enxia Wang, Lingtao Ou, Weili Li, Xiaopeng Lv, Shuaiyan Gan, Ya Wang
  • Publication number: 20200208252
    Abstract: The present disclosure relates to a method of a mask layout, including: providing a frame with preset areas arranged at intervals, a positioning area between two adjacent preset areas, and a fixed area provided to offset from the positioning area and each of the preset areas, and a distance between two adjacent preset areas being a first predetermined distance L1; providing a cover mask corresponding to the positioning area, and a distance between an edge of the cover mask and the center of the positioning area being a second predetermined distance L2; and providing an evaporation mask on the fixed area according to preset conditions, a distance between two adjacent fixed areas being a third predetermined distance L3, and the third predetermined distance L3 being equal to a difference between the first predetermined distance L1 and the second predetermined distance L2.
    Type: Application
    Filed: March 12, 2020
    Publication date: July 2, 2020
    Inventors: Enxia WANG, Lingtao OU, Weili LI, Xiaopeng LV, Shuaiyan GAN, Ya WANG