Abstract: Devices and methods for separating cells include a membrane that allows cells to pass from a first chamber to a second chamber.

Abstract: A device for detecting an analyte in a sample comprising: an array including a plurality of pixels, each pixel including a nanochain comprising: a first nanostructure, a second nanostructure, and a third nanostructure, wherein size of the first nanostructure is larger than that of the second nanostructure, and size of the second nanostructure is larger than that of the third nanostructure, and wherein the first nanostructure, the second nanostructure, and the third nanostructure are positioned on a substrate such that when the nanochain is excited by an energy, an optical field between the second nanostructure and the third nanostructure is stronger than an optical field between the first nanostructure and the second nanostructure, wherein the array is configured to receive a sample; and a detector arranged to collect spectral data from a plurality of pixels of the array.

Abstract: A device for detecting an analyte in a sample comprising: an array including a plurality of pixels, each pixel including a nanochain comprising: a first nanostructure, a second nanostructure, and a third nanostructure, wherein size of the first nanostructure is larger than that of the second nanostructure, and size of the second nanostructure is larger than that of the third nanostructure, and wherein the first nanostructure, the second nanostructure, and the third nanostructure are positioned on a substrate such that when the nanochain is excited by an energy, an optical field between the second nanostructure and the third nanostructure is stronger than an optical field between the first nanostructure and the second nanostructure, wherein the array is configured to receive a sample; and a detector arranged to collect spectral data from a plurality of pixels of the array.

Abstract: A device for detecting an analyte in a sample comprising: an array including a plurality of pixels, each pixel including a nanochain comprising: a first nanostructure, a second nanostructure, and a third nanostructure, wherein size of the first nanostructure is larger than that of the second nanostructure, and size of the second nanostructure is larger than that of the third nanostructure, and wherein the first nanostructure, the second nanostructure, and the third nanostructure are positioned on a substrate such that when the nanochain is excited by an energy, an optical field between the second nanostructure and the third nanostructure is stronger than an optical field between the first nanostructure and the second nanostructure, wherein the array is configured to receive a sample; and a detector arranged to collect spectral data from a plurality of pixels of the array.

Abstract: Devices and methods for separating cells include a membrane that allows cells to pass from a first chamber to a second chamber.

Abstract: A device for detecting an analyte in a sample comprising: an array including a plurality of pixels, each pixel including a nanochain comprising: a first nanostructure, a second nanostructure, and a third nanostructure, wherein size of the first nanostructure is larger than that of the second nanostructure, and size of the second nanostructure is larger than that of the third nanostructure, and wherein the first nanostructure, the second nanostructure, and the third nanostructure are positioned on a substrate such that when the nanochain is excited by an energy, an optical field between the second nanostructure and the third nanostructure is stronger than an optical field between the first nanostructure and the second nanostructure, wherein the array is configured to receive a sample; and a detector arranged to collect spectral data from a plurality of pixels of the array.

Abstract: Methods are provided for obtaining hollow nano-structures which include the steps of providing a suspended film starting layer on a support substrate, depositing on the starting layer a sacrificial layer, performing, in progressive sequence, a complete erosion phase of said support substrate and starting layer and performing an at least partial erosion phase of the sacrificial layer previously deposited on the starting layer so as to obtain holes passing through the starting layer and passing or non passing through the sacrificial layer, depositing, on the side of the support substrate opposite to that where the starting layer is put, at least one covering layer arranged to internally cover the holes created by the progressive erosion. Hollow nano-structures formed by such methods are also provided.

Abstract: Methods are provided for obtaining hollow nano-structures which include the steps of providing a suspended film starting layer on a support substrate, depositing on the starting layer a sacrificial layer, performing, in progressive sequence, a complete erosion phase of said support substrate and starting layer and performing an at least partial erosion phase of the sacrificial layer previously deposited on the starting layer so as to obtain holes passing through the starting layer and passing or non passing through the sacrificial layer, depositing, on the side of the support substrate opposite to that where the starting layer is put, at least one covering layer arranged to internally cover the holes created by the progressive erosion. Hollow nano-structures formed by such methods are also provided.

Abstract: What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first resist on a substrate; depositing a layer of a second resist on the layer of the first resist; forming a pattern of the second resist by lithography; depositing a further layer of the first resist on the previous layers; and forming a pattern of the first resist by lithography. The second resist is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first; in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist is sensitive, and therefore the processes of exposure and development of the two resists are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.

Abstract: An apparatus for determining the internal outline of a duct or cavity, comprises light-emitting means (71) suitable for generating a collimated light beam, an elongate probe element (51; 51?; 51?) suitable for being introduced into the duct and for guiding the collimated beam along a predetermined propagation direction, reflector means (52) supported by the probe element (51; 51?; 51?) and suitable for deflecting the collimated beam so as to illuminate the internal wall of the duct, and for deflecting the reflected or diffused light coming from an illuminated point (P) of the internal wall so as to guide it along the probe element (51; 51?; 51?), and detection means (76) suitable for receiving an image of the illuminated point (P), which image is correlated with the optical distance of the point from the detection means (76), and for providing a corresponding electrical signal. The image is formed by the light guided by the receiving reflector means (52).

Abstract: An apparatus for determining the internal outline of a duct or cavity, comprises light-emitting means (71) suitable for generating a collimated light beam, an elongate probe element (51; 51?; 51?) suitable for being introduced into the duct and for guiding the collimated beam along a predetermined propagation direction, reflector means (52) supported by the probe element (51; 51?; 51?) and suitable for deflecting the collimated beam so as to illuminate the internal wall of the duct, and for deflecting the reflected or diffused light coming from an illuminated point (P) of the internal wall so as to guide it along the probe element (51; 51?; 51?), and detection means (76) suitable for receiving an image of the illuminated point (P), which image is correlated with the optical distance of the point from the detection means (76), and for providing a corresponding electrical signal. The image is formed by the light guided by the receiving reflector means (52).

Abstract: What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first resist on a substrate; depositing a layer of a second resist on the layer of the first resist; forming a pattern of the second resist by lithography; depositing a further layer of the first resist on the previous layers; and forming a pattern of the first resist by lithography. The second resist is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first; in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist is sensitive, and therefore the processes of exposure and development of the two resists are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.