Patents by Inventor Eran Dvir
Eran Dvir has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080115614Abstract: A system for controlling an axial movement of an article is presented. The system comprises a support stage assembly and a spring suspension arrangement mounted on the support stage assembly. The spring suspension arrangement comprises first and second assemblies arranged in a coaxial relationship one inside the other. The first assembly is attached to the support stage assembly. The second assembly serves for supporting an article-carrying member and is driven for movement along the axis with respect to the first assembly. The outer one of the first and second assemblies is configured to define two spaced-apart parallel planes perpendicular to said axis. The first and second assemblies are attached to each other by first and second membrane-like members arranged in a spaced-apart parallel relationship along said axis.Type: ApplicationFiled: January 18, 2008Publication date: May 22, 2008Inventors: Eran Dvir, Beniamin Shulman
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Patent number: 7320265Abstract: A system for controlling an axial movement of an article is presented. The system comprises a support stage assembly and a spring suspension arrangement mounted on the support stage assembly. The spring suspension arrangement comprises first and second assemblies arranged in a coaxial relationship one inside the other. The first assembly is attached to the support stage assembly. The second assembly serves for supporting an article-carrying member and is driven for movement along the axis with respect to the first assembly. The outer one of the first and second assemblies is configured to define two spaced-apart parallel planes perpendicular to said axis. The first and second assemblies are attached to each other by first and second membrane-like members arranged in a spaced-apart parallel relationship along said axis.Type: GrantFiled: August 25, 2003Date of Patent: January 22, 2008Assignee: Nova Measuring Instruments Ltd.Inventors: Eran Dvir, Beniamin Shulman
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Publication number: 20050229725Abstract: An apparatus is provided for supporting semiconductor wafer in a wafer processing system. The apparatus comprises at least two wafer support assemblies, defining respectively at least two wafer support levels and being mounted between opposing support beams; one or more supporting bases connected to or integral with each of the wafer support assemblies; and a motion unit coupled to the support beams.Type: ApplicationFiled: February 28, 2005Publication date: October 20, 2005Applicant: Nova Measuring Instruments Ltd.Inventor: Eran Dvir
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Patent number: 6860790Abstract: An apparatus is provided for supporting semiconductor wafer in a wafer processing system. The apparatus comprises at least two wafer support assemblies, defining respectively at least two wafer support levels and being mounted between opposing support beams; one or more supporting bases connected to or integral with each of the wafer support assemblies; and a motion unit coupled to the support beams.Type: GrantFiled: July 31, 2003Date of Patent: March 1, 2005Assignee: NOVA Measuring Instruments Ltd.Inventor: Eran Dvir
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Publication number: 20040246012Abstract: A system for controlling an axial movement of an article is presented. The system comprises a support stage assembly and a spring suspension arrangement mounted on the support stage assembly. The spring suspension arrangement comprises first and second assemblies arranged in a coaxial relationship one inside the other. The first assembly is attached to the support stage assembly. The second assembly serves for supporting an article-carrying member and is driven for movement along the axis with respect to the first assembly. The outer one of the first and second assemblies is configured to define two spaced-apart parallel planes perpendicular to said axis. The first and second assemblies are attached to each other by first and second membrane-like members arranged in a spaced-apart parallel relationship along said axis.Type: ApplicationFiled: August 25, 2003Publication date: December 9, 2004Inventors: Eran Dvir, Beniamin Shulman
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Publication number: 20040074322Abstract: An apparatus is provided for supporting semiconductor wafer in a wafer processing system. The apparatus comprises at least two wafer support assemblies, defining respectively at least two wafer support levels and being mounted between opposing support beams; one or more supporting bases connected to or integral with each of the wafer support assemblies; and a motion unit coupled to the support beams.Type: ApplicationFiled: July 31, 2003Publication date: April 22, 2004Inventor: Eran Dvir
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Patent number: 6619144Abstract: A processing unit for processing at least one semiconductor wafer includes a processing station for processing the wafer, a measuring station for measuring the at least one wafer, a robot for moving the wafer between the processing and measuring stations, a wafer handling system and a buffer station. The wafer handling system operates in conjunction with the measuring station and moves the wafer to and from a measuring location on the measuring unit. The buffer station is associated with the wafer handling system and receives measured and unmeasured wafers thereby to enable the robot to arrive at and leave the measuring station with at least one wafer thereon.Type: GrantFiled: April 2, 2001Date of Patent: September 16, 2003Assignee: Nova Measuring Instruments Ltd.Inventor: Eran Dvir
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Patent number: 6543461Abstract: A buffer station for an article handling system, the handling system having a general path along which it moves when handling the article, the buffer station including at least two supporting assemblies including supporting elements forming a supporting plane each capable of supporting an article within the supporting plane and located so as to support the article within the general path, at least two receptacles for liquid in which the at least two supporting assemblies are disposed, and at least two drivers associated with the at least two supporting assemblies and the receptacles for shifting them in and out of the general path.Type: GrantFiled: November 30, 2000Date of Patent: April 8, 2003Assignee: Nova Measuring Instruments Ltd.Inventors: Eli Haimovich, Eran Dvir
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Patent number: 6368182Abstract: A monitoring tool for monitoring an article in a wet environment, the monitoring tool including a monitoring station having an optical unit, a liquid holding unit for receiving the article, and a window, through which at least a portion of the article is viewable by the optical unit, a buffer station associated with the monitoring station having a plurality of supporting assemblies for receiving the article before and after being monitored, wherein at least one of the supporting assemblies includes a liquid receptacle for holding the article therein, and a gripping unit operating in conjunction with the monitoring station for moving the article from the buffer station to the liquid holding unit of the monitoring station.Type: GrantFiled: June 11, 2001Date of Patent: April 9, 2002Assignee: Nova Measuring Instruments Ltd.Inventors: Eran Dvir, Moshe Finarov, Eli Haimovich, Benjamin Shulman, Rony Abaron
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Patent number: 6368181Abstract: An optical system is disclosed for the inspection of wafers during polishing which also includes a measurement system for measuring the thickness of the wafer's top layer. The optical system views the wafer through a window and includes a gripping system, which places the wafer in a predetermined viewing location while maintaining the patterned surface completely under water. The optical system also includes a pull-down unit for pulling the measurement system slightly below the horizontal prior to the measurement and returns the measuring system to the horizontal afterwards.Type: GrantFiled: February 4, 2000Date of Patent: April 9, 2002Assignee: Nova Measuring Instruments Ltd.Inventors: Eran Dvir, Moshe Finarov, Eli Haimovich, Beniamin Shulman
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Publication number: 20010031608Abstract: A monitoring tool for monitoring an article in a wet environment, the monitoring tool including a monitoring station having an optical unit, a liquid holding unit for receiving the article, and a window, through which at least a portion of the article is viewable by the optical unit, a buffer station associated with the monitoring station having a plurality of supporting assemblies for receiving the article before and after being monitored, wherein at least one of the supporting assemblies includes a liquid receptacle for holding the article therein, and a gripping unit operating in conjunction with the monitoring station for moving the article from the buffer station to the liquid holding unit of the monitoring station.Type: ApplicationFiled: June 11, 2001Publication date: October 18, 2001Inventors: Eran Dvir, Moshe Finarov, Eli Haimovich, Beniamin Shulman, Rony Aharon
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Publication number: 20010025533Abstract: A processing unit for processing at least one semiconductor wafer includes a processing station for processing the wafer, a measuring station for measuring the at least one wafer, a robot for moving the wafer between the processing and measuring stations, a wafer handling system and a buffer station. The wafer handling system operates in conjunction with the measuring station and moves the wafer to and from a measuring location on the measuring unit. The buffer station is associated with the wafer handling system and receives measured and unmeasured wafers thereby to enable the robot to arrive at and leave the measuring station with at least one wafer thereon.Type: ApplicationFiled: April 2, 2001Publication date: October 4, 2001Inventor: Eran Dvir
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Publication number: 20010001888Abstract: A buffer station for an article handling system, the handling system having a general path along which it moves when handling the article, the buffer station including at least two supporting assemblies including supporting elements forming a supporting plane each capable of supporting an article within the supporting plane and located so as to support the article within the general path, at least two receptacles for liquid in which the at least two supporting assemblies are disposed, and at least two drivers associated with the at least two supporting assemblies and the receptacles for shifting them in and out of the general path.Type: ApplicationFiled: November 30, 2000Publication date: May 31, 2001Inventors: Eli Haimovich, Eran Dvir
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Patent number: 6212961Abstract: A processing unit for processing at least one semiconductor wafer includes a processing station for processing the wafer, a measuring station for measuring the at least one water, a robot for moving the wafer between the processing and measuring stations, a wafer handling system and a buffer station. The wafer handling system operates in conjunction with the measuring station and moves the wafer to and from a measuring location on the measuring unit. The buffer station is associated with the wafer handling system and receives measured and unmeasured wafers thereby to enable the robot to arrive at and leave the measuring station with at least one wafer thereon.Type: GrantFiled: February 11, 1999Date of Patent: April 10, 2001Assignee: NOVA Measuring Instruments Ltd.Inventor: Eran Dvir
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Patent number: 6045433Abstract: An optical system is disclosed for the inspection of wafers during polishing which also includes a measurement system for measuring the thickness of the wafer's top layer. The optical system views the wafer through a window and includes a gripping system, which places the wafer in a predetermined viewing location while maintaining the patterned surface completely under water. The optical system also includes a pull-down unit for pulling the measurement system slightly below the horizontal prior to the measurement and returns the measuring system to the horizontal afterwards.Type: GrantFiled: June 29, 1995Date of Patent: April 4, 2000Assignee: Nova Measuring Instruments, Ltd.Inventors: Eran Dvir, Eli Haimovich, Benjamin Shulman