Abstract: The invention relates to certain non-flammable compositions containing 1,1,1,3,3-pentafluorobutane (R365mfc), 1,2-dichloroethylene and a hydrofluoroether, to mixtures containing these compositions and to the use of these non-flammable compositions or these mixtures, especially as precision cleaning agents for solid surfaces and for flushing, especially of refrigeration systems.

Abstract: Non-flammable ternary compositions and use of these compositions. The invention relates to certain non-flammable compositions containing, 1,1,3,3-pentafluorobutane (R365mfc), 1,2-dichloroethylene and a hydrofluoroether, to mixtures containing these compositions and to the use of these non-flammable compositions or these mixtures, especially as precision cleaning agents for solid surfaces and for flushing, especially of refrigeration systems.

Abstract: A process for the selective dehydrofluorination of hydrochlorofluoroalkanes and novel hydrochlorofluoroalkenes is described wherein an effective amount of a catalytically active metal compound is applied which is selected from the group consisting of AlF3??, MgAlxF2+3x?? and MgZryF2+4y??, wherein x and y have, independently of one another, values in the range of from 0 to 0.33 and ? has a value in the range of from 0 to 0.1. Certain hydrofluorochloroalkenes are also described, as well as their use as intermediates in chemical reactions.

Abstract: A process for the selective dehydrochlorination of a hydrochlorofluoroalkane by using chloride fluorides of Ba, Ca, or Sr as catalysts, wherein the hydrochlorofluoroalkane comprises a carbon atom or carbon atoms carrying at least one chlorine and at least one fluorine atom and further comprises at least one hydrogen atom on a carbon atom vicinal to the carbon atom or to the carbon atoms carrying the at least one chlorine and at least one fluorine atom.

Abstract: One or more hydrochlorofluoroalkenes can be produced by dehydrofluorination of a hydrochlorofluoroalkane over a X-ray amorphous high surface metal fluoride or a X-ray amorphous or weakly crystalline metal oxide fluoride wherein the metal is selected from the 2nd, 3rd or 4th main group or any subgroup of the periodic system of elements. High-surface aluminum fluoride or aluminum oxide fluoride are especially suitable as catalysts. For example, CF3CH2CHClF is reacted to produce CF3CH?CHCl, and CF3CH2CClFCH3 is reacted to form CF3CH2CCl?CH2 and/or CF3CH?CClCH3.

Abstract: A process for the selective dehydrofluorination of hydrochlorofluoroalkanes and novel hydrochlorofluoroalkenes is described wherein an effective amount of a catalytically active metal compound is applied which is selected from the group consisting of AlF3??, MgAlxF2+3x?? and MgZryF2+4y??, wherein x and y have, independently of one another, values in the range of from 0 to 0.33 and ? has a value in the range of from 0 to 0.1. Certain hydrofluorochloroalkenes are also described, as well as their use as intermediates in chemical reactions.

Abstract: Elemental fluorine is used as etching agent for the manufacture of electronic devices, especially semiconductor devices, micro-electromechanical devices, thin film transistors, flat panel displays and solar panels, and as chamber cleaning agent mainly for plasma-enhanced chemical vapor deposition (PECVD) apparatus. For this purpose, fluorine often is produced on-site. The invention provides a process for the manufacture of electronic devices wherein fluorine is produced on site and is purified from HF by a low temperature treatment. A pressure of between 1.5 and 20 Bars absolute is especially advantageous.

Abstract: A process for the selective dehydrochlorination of a hydrochlorofluoroalkane by using chloride fluorides of Ba, Ca, or Sr as catalysts, wherein the hydrochlorofluoroalkane comprises a carbon atom or carbon atoms carrying at least one chlorine and at least one fluorine atom and further comprises at least one hydrogen atom on a carbon atom vicinal to the carbon atom or to the carbon atoms carrying the at least one chlorine and at least one fluorine atom.

Abstract: Halogenated alkenes, especially fluorinated alkenes can be prepared from halogenated and fluorinated alkanes, respectively, by dehydrohalogenation or dehydrofluorination in the presence of a high-surface metal fluoride or oxifluoride. Preferably, trifluoroethylene, pentafluoropropene, tetrafluorobutenes or trifluorobutadiene are prepared. Aluminum fluoride is highly suitable. The metal fluoride or oxifluoride can be applied supported on a carrier.

Abstract: Use of certain hydrofluoroalkenes for foam blowing, solvent cleaning, refrigeration, as etching gas for semiconductor etching or chamber cleaning, heat transfer, fire extinguishing and for the production of aerosols.

Abstract: One or more hydrochlorofluoroalkenes can be produced by dehydrofluorination of a hydrochlorofluoroalkane over a X-ray amorphous high surface metal fluoride or a X-ray amorphous or weakly crystalline metal oxide fluoride wherein the metal is selected from the 2nd, 3rd or 4th main group or any subgroup of the periodic system of elements. High-surface aluminum fluoride or aluminum oxide fluoride are especially suitable as catalysts. For example, CF3CH2CHClF is reacted to produce CF3CH?CHCl, and CF3CH2CClFCH3 is reacted to form CF3CH2CCl?CH2 and/or CF3CH?CClCH3.

Abstract: A hydrofluoroolefin and hydrofluoroolefin isomers and a process for manufacture them comprising eliminating HF from a fluorinated precursor compound are described. The fluorinated precursor compound may be provided by fluorinating a chlorinated precursor. The fluorinated precursor compound may be a fluorinated alkane. The hydroolefines are suitable as blowing agents, heat transfer fluids, or drying agents or degreasing solvents.

Abstract: Halogenated alkenes, especially fluorinated alkenes can be prepared from halogenated and fluorinated alkanes, respectively, by dehydrohalogenation or dehydrofluorination in the presence of a high-surface metal fluoride or oxifluoride. Preferably, trifluoroethylene, pentafluoropropene, tetrafluorobutenes or trifluorobutadiene are prepared. Aluminium fluoride is highly suitable. The metal fluoride or oxifluoride can be applied supported on a carrier.

Abstract: The invention consequently relates, in one aspect, to a process for obtaining a hydrofluoroalkane comprising at least two carbon atoms, which is purified of unsaturated organic impurities, according to which the hydrofluoroalkane containing organic impurities including (chloro)fluoro olefins is subjected to at least one purification treatment with bromine or BrCl, preferably in the presence of, an initiator. The process is suitable, for example, to purify 1,1,1,2-tetrafluoroethane. A further aspect concerns the application of LEDs or OLEDs to support chemical reactions of the gas-gas, liquid-liquid or gas-liquid type, and a respective reactor.