Patents by Inventor Erez Ravid

Erez Ravid has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7990546
    Abstract: A method for characterizing a surface of a sample object, the method including dividing the surface into pixels which are characterized by a parameter variation, and defining blocks of the surface as respective groups of the pixels. The method further includes irradiating the pixels in multiple scans over the surface with radiation having different, respective types of polarization, and detecting returning radiation from the pixels in response to each of the scans. For each scan, respective block signatures of the blocks are constructed, in response to the returning radiation from the group of pixels in each block. Also for each scan, a block signature variation using the respective block signatures of the blocks is determined. In response to the block signature variation, one or more of the types of polarization for use in subsequent examination of a test object are selected.
    Type: Grant
    Filed: July 15, 2008
    Date of Patent: August 2, 2011
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Jeong Ho Yeo, Efrat Rosenman, Erez Ravid, Doron Meshulach, Gadi Greenberg, Kobi Kan, Yehuda Cohen, Shimon Levi
  • Patent number: 7760929
    Abstract: Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: July 20, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Jacob J. Orbon, Youval Nehmadi, Ofer Bokobza, Ariel Ben-Porath, Erez Ravid, Rinat Shimshi, Vicky Svidenko
  • Patent number: 7760347
    Abstract: Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: July 20, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Youval Nehmadi, Ofer Bokobza, Ariel Ben-Porath, Erez Ravid, Rinat Shishi, Vicky Svidenko, Gilad Almogy, Jacob J. Orbon, Jr.
  • Publication number: 20090021749
    Abstract: A method for characterizing a surface of a sample object, the method including dividing the surface into pixels which are characterized by a parameter variation, and defining blocks of the surface as respective groups of the pixels. The method further includes irradiating the pixels in multiple scans over the surface with radiation having different, respective types of polarization, and detecting returning radiation from the pixels in response to each of the scans. For each scan, respective block signatures of the blocks are constructed, in response to the returning radiation from the group of pixels in each block. Also for each scan, a block signature variation using the respective block signatures of the blocks is determined. In response to the block signature variation, one or more of the types of polarization for use in subsequent examination of a test object are selected.
    Type: Application
    Filed: July 15, 2008
    Publication date: January 22, 2009
    Inventors: Jeong Ho Yeo, Efrat Rosenman, Erez Ravid, Doron Meshulach, Gadi Greenberg, Kobi Kan, Yehuda Cohen, Shimon Levi
  • Publication number: 20070052963
    Abstract: Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.
    Type: Application
    Filed: October 27, 2006
    Publication date: March 8, 2007
    Inventors: JACOB ORBON, Youval Nehmadi, Ofer Bokobza, Ariel Ben-Porath, Erez Ravid, Rinat Shimshi, Vicky Svidenko
  • Publication number: 20060269120
    Abstract: Methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks used in lithographically writing patterns into such wafers are provided. For some embodiments, by analyzing the layout in the neighborhood of the defect, and matching it to similar defected neighborhoods in different locations across the die, defects may be categorized by common structures in which they occur.
    Type: Application
    Filed: May 15, 2006
    Publication date: November 30, 2006
    Inventors: YOUVAL NEHMADI, Ofer Bokobza, Ariel Ben-Porath, Erez Ravid, Rinat Shimsht, Vicky Svidenko, Gilad Almogy
  • Patent number: 6256093
    Abstract: A system for on-the-fly automatic defect classification (ADC) in a scanned wafer. The system includes a light source illuminating the scanned wafer so as to generate an illuminating spot incident on the wafer. Sensor collecting light scattered from the spot by the at least two spaced apart detectors, and processor analyzing the collected light so as to detect defects in the wafer and classifying the defects into distinct defect types.
    Type: Grant
    Filed: June 25, 1998
    Date of Patent: July 3, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Erez Ravid, Ido Holcman, Vladimir Mikolinsky