Patents by Inventor Eri Suzuki

Eri Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Target and process for its production, and method of forming a film having a high refractive index
    Patent number: 6743343
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: June 1, 2004
    Assignee: Asahi Glass Ceramics Co., Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Target and process for its production, and method for forming a film having a high refractive index
    Publication number: 20030000828
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Application
    Filed: July 10, 2002
    Publication date: January 2, 2003
    Applicant: ASAHI GLASS COMPANY LTD.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Target and process for its production, and method for forming a film having a high refractive index
    Patent number: 6440278
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: August 27, 2002
    Assignee: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Target and process for its production, and method for forming a film having a high refractive index
    Publication number: 20020027817
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Application
    Filed: September 28, 2001
    Publication date: March 7, 2002
    Applicant: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Target and process for its production, and method for forming a film having a high refractive index
    Patent number: 6334938
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: December 5, 2000
    Date of Patent: January 1, 2002
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Target and process for its production, and method for forming a film having a high refractive index
    Publication number: 20010020586
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Application
    Filed: December 5, 2000
    Publication date: September 13, 2001
    Applicant: Asahi Glass Company, Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Target and process for its production, and method for forming a film having a highly refractive index
    Patent number: 6193856
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: March 12, 1998
    Date of Patent: February 27, 2001
    Assignee: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Process for forming a furnace wall
    Patent number: 6117373
    Abstract: A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.
    Type: Grant
    Filed: March 16, 1998
    Date of Patent: September 12, 2000
    Assignee: Asashi Glass Company Ltd.
    Inventors: Otojiro Kida, Eri Suzuki, Yasushi Ono
  • Monolithic refractory composition wall
    Patent number: 5783510
    Abstract: A monolithic refractory composition, which can be rapidly dried after being mixed with water and applied to a desired portion by casting or spraying to form a furnace wall, and which comprises refractory aggregates, a refractory powder, an aluminum alloy powder and a dispersant, wherein the aluminum alloy powder is contained in an amount of from 0.04 to 5 parts by weight per 100 parts by weight of the total amount of the refractory aggregates and the refractory powder.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: July 21, 1998
    Assignee: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Eri Suzuki, Yasushi Ono