Patents by Inventor Eri UEMURA

Eri UEMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CLEANLINESS MEASURING CARRIAGE AND CLEANLINESS MEASURING SYSTEM
    Publication number: 20140230522
    Abstract: A cleanliness measuring carriage includes a cleanliness measuring device for measuring cleanliness within a semiconductor manufacturing room, a holding unit for holding the cleanliness measuring device, and a conveying unit for conveying the cleanliness measuring device along a substrate container transport lane.
    Type: Application
    Filed: August 29, 2013
    Publication date: August 21, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Eri UEMURA, Makiko KATANO, Tsunekazu YASUTAKE
  • Sample contamination method
    Patent number: 8771535
    Abstract: A sample contamination method according to an embodiment includes spraying a chemical solution containing contaminants into a casing, carrying a semiconductor substrate into the casing filled with the chemical solution by the spraying, leaving the semiconductor substrate in the casing filled with the chemical solution for a predetermined time, and carrying the semiconductor substrate out of the casing after the predetermined time passes.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: July 8, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuji Yamada, Makiko Katano, Ayako Mizuno, Eri Uemura, Asuka Uchinuno, Chikashi Takeuchi
  • SAMPLE CONTAMINATION METHOD
    Publication number: 20120149199
    Abstract: A sample contamination method according to an embodiment includes spraying a chemical solution containing contaminants into a casing, carrying a semiconductor substrate into the casing filled with the chemical solution by the spraying, leaving the semiconductor substrate in the casing filled with the chemical solution for a predetermined time, and carrying the semiconductor substrate out of the casing after the predetermined time passes.
    Type: Application
    Filed: July 22, 2011
    Publication date: June 14, 2012
    Inventors: Yuji YAMADA, Makiko KATANO, Ayako MIZUNO, Eri UEMURA, Asuka UCHINUNO, Chikashi TAKEUCHI
  • MASK CLEANING METHOD, MASK CLEANING APPARATUS, AND PELLICLE
    Publication number: 20110203611
    Abstract: Embodiments disclose a method for cleaning a mask having a mask film that is of a surface to which a foreign substance containing silicon oxide adheres. In the method, the mask is retained in a cleaning gas containing diluted hydrofluoric acid vapor at a temperature at which an etching rate to the foreign substance becomes higher than an etching rate to the mask film. Further, in the method, the cleaning gas is supplied to the surface of the mask to etch the foreign substance.
    Type: Application
    Filed: December 10, 2010
    Publication date: August 25, 2011
    Inventors: Eri UEMURA, Makiko KATANO, Yuji YAMADA
  • METHOD OF CLEANING MASK AND MASK CLEANING APPARATUS
    Publication number: 20110100393
    Abstract: The method of cleaning a mask of an embodiment includes irradiating a mask film having a mask pattern on a substrate with an energy radiation and heightening a temperature of the mask film than that of the substrate.
    Type: Application
    Filed: September 14, 2010
    Publication date: May 5, 2011
    Inventors: Eri UEMURA, Makiko KATANO, Haruko AKUTSU, Shinji YAMAGUCHI, Kyo OTSUBO, Ayako MIZUNO