Patents by Inventor Eric A. H. Timmermans

Eric A. H. Timmermans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method of reducing particle contamination of semiconductor substrates
    Patent number: 7553516
    Abstract: Particle contamination of semiconductor substrates due to particles coming off of wafer boat rods is reduced. A gas flow is established with the boat rods downstream of the substrates, to blow particles from the boat rods away from the substrates. The boat rods can also be placed upstream of the substrates in the gas flow, and a flow deflector is used to minimize the flow of gas contacting the boat rods, to reduce the amount of particles being blown off the rods. In addition, the gas flow can be below a rate at which particle generation is likely or can be at a sufficiently high rate to minimize the possibility of particles settling on the substrates.
    Type: Grant
    Filed: December 16, 2005
    Date of Patent: June 30, 2009
    Assignee: ASM International N.V.
    Inventors: Louis J. M. Selen, Eric A. H. Timmermans, Gerrit ten Bolscher
  • Reactor precoating for reduced stress and uniform CVD
    Patent number: 6974781
    Abstract: A method is provided for obtaining stable and elevated deposition rates in a reaction chamber, following the cleaning of the chamber. The method involves cleaning of the chamber, pre-coating the interior surfaces of the reaction chamber with an inorganic composition, and then, using the pre-coated chamber to deposit an organic layer onto a workpiece.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: December 13, 2005
    Assignee: ASM International N.V.
    Inventors: Eric A. H. Timmermans, Maarten J. Teepen, Raffaele Mucciato, Rudi Wilhelm