Patents by Inventor Eric Bernard Westphal

Eric Bernard Westphal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shared compliance in a rapid exchange device for reticles, and reticle stage
    Patent number: 9025135
    Abstract: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: May 5, 2015
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Richard John Johnson, Frits Van Der Meulen, Eric Bernard Westphal, Jeremy Rex Heaston
  • Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage
    Publication number: 20120092640
    Abstract: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.
    Type: Application
    Filed: February 24, 2010
    Publication date: April 19, 2012
    Applicant: ASML HOLDING N.V.
    Inventors: Richard John Johnson, Frits Van Der Meulen, Eric Bernard Westphal