Abstract: Catadioptric projector systems, devices, and methods are provided in accordance with various embodiments. For example, some embodiments include a catadioptric projector that may include: a radiation source; a static pattern generating element and/or a time-varying pattern generating element configured to condition radiation from the radiation source to produce the patterned illumination; and/or a convex reflector positioned to project the patterned illumination. Some embodiments include a system that includes a catadioptric projector and a camera configured to acquire one or more images based on the patterned illumination. Systems and methods in accordance with various embodiments are provided to estimate a distance to a point on an object based on the one or more acquired images.

Abstract: Catadioptric projector systems, devices, and methods are provided in accordance with various embodiments. For example, some embodiments include a catadioptric projector that may include: a radiation source; a static pattern generating element and/or a time-varying pattern generating element configured to condition radiation from the radiation source to produce the patterned illumination; and/or a convex reflector positioned to project the patterned illumination. Some embodiments include a system that includes a catadioptric projector and a camera configured to acquire one or more images based on the patterned illumination. Systems and methods in accordance with various embodiments are provided to estimate a distance to a point on an object based on the one or more acquired images.

Abstract: The frequency-sampling method is widely used to accommodate nonlinear electromagnetic source tuning in swept-wavelength interferometric techniques, such as optical frequency domain reflectometry (OFDR) and swept-wavelength optical coherence tomography (OCT). Two sources of sampling errors are associated with the frequency-sampling method. One source of error is the limit of an underlying approximation for long interferometer path mismatches and fast electromagnetic source tuning rates. A second source of error is transmission delays in data acquisition hardware. Aspects of the invention relate to a method and system for correcting sampling errors in swept-wavelength interferometry systems such that the two error sources correct sampling errors associated with the first radiation path and the second radiation path cancel to second order.

Abstract: The frequency-sampling method is widely used to accommodate nonlinear electromagnetic source tuning in swept-wavelength interferometric techniques, such as optical frequency domain reflectometry (OFDR) and swept-wavelength optical coherence tomography (OCT). Two sources of sampling errors are associated with the frequency-sampling method. One source of error is the limit of an underlying approximation for long interferometer path mismatches and fast electromagnetic source tuning rates. A second source of error is transmission delays in data acquisition hardware. Aspects of the invention relate to a method and system for correcting to sampling errors in swept-wavelength interferometry systems such that the two error sources correct sampling errors associated with the first radiation path and the second radiation path cancel to second order.

Abstract: A waveguide array is fabricated by providing a photoreactive material and generating an optical intensity pattern corresponding to a geometry of the waveguide array. A relative translation of the photoreactive material is effected through the optical intensity pattern. Thereafter, the photoreactive material is rendered substantially unreactive to light at at least a wavelength of the optical intensity pattern.

Abstract: A system and method for aligning aircraft coordinate systems includes determining a first coordinate in the first coordinate system from a first reflector using a first coordinate positioning device, and determining second and third coordinates in the second coordinate system from second and third reflectors, respectively, using a second coordinate positioning device. The second and third reflectors are disposed at predetermined distances from the first reflector. The system aligns the first and second coordinate systems based on the first, second, and third coordinates and the predetermined distances using a processor.

Abstract: A system and method for aligning aircraft coordinate systems includes determining a first coordinate in the first coordinate system from a first reflector using a first coordinate positioning device, and determining second and third coordinates in the second coordinate system from second and third reflectors, respectively, using a second coordinate positioning device. The second and third reflectors are disposed at predetermined distances from the first reflector. The system aligns the first and second coordinate systems based on the first, second, and third coordinates and the predetermined distances using a processor.

Abstract: A system and method for aligning aircraft coordinate systems includes determining a first coordinate in the first coordinate system from a first reflector using a first coordinate positioning device, and determining second and third coordinates in the second coordinate system from second and third reflectors, respectively, using a second coordinate positioning device. The second and third reflectors are disposed at predetermined distances from the first reflector. The system aligns the first and second coordinate systems based on the first, second, and third coordinates and the predetermined distances using a processor.

Abstract: A method for assembling an aircraft includes determining a three-dimensional representation of a first aircraft structure and a second aircraft structure using an optical positioning device. A predicted mate of the first aircraft structure and the second aircraft structure is generated from the three-dimensional representation of the first and second aircraft structures using a processor. The method further includes adjusting the predicted mate of the first and second aircraft structures to enhance performance characteristics of the aircraft using the processor.