Patents by Inventor Eric E. Kron

Eric E. Kron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide
    Patent number: 11361972
    Abstract: Some embodiments include a method in which an assembly is formed to have a first silicon-dioxide-containing-material and a second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material has a higher concentration of dopant therein than does the second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material is selectively removed relative to the second silicon-dioxide-containing-material using a mixture which includes hydrofluoric acid, a second acid and an organic solvent. The organic solvent may include at least one ester and/or at least one ether. The second acid may have a pKa of less than about 5.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: June 14, 2022
    Assignee: Micron Technology, Inc.
    Inventors: Jerome A. Imonigie, Ramaswamy Ishwar Venkatanarayanan, Pranav P. Sharma, Eric E. Kron, Sanjeev Sapra
  • Methods for Selectively Removing More-Doped-Silicon-Dioxide relative to Less-Doped-Silicon-Dioxide
    Publication number: 20200335351
    Abstract: Some embodiments include a method in which an assembly is formed to have a first silicon-dioxide-containing-material and a second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material has a higher concentration of dopant therein than does the second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material is selectively removed relative to the second silicon-dioxide-containing-material using a mixture which includes hydrofluoric acid, a second acid and an organic solvent. The organic solvent may include at least one ester and/or at least one ether. The second acid may have a pKa of less than about 5.
    Type: Application
    Filed: April 18, 2019
    Publication date: October 22, 2020
    Applicant: Micron Technology, Inc.
    Inventors: Jerome A. Imonigie, Ramaswamy Ishwar Venkatanarayanan, Pranav P. Sharma, Eric E. Kron, Sanjeev Sapra