Patents by Inventor Eric Fleury
Eric Fleury has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9014042Abstract: The invention relates to a system for determining surroundings in a wireless network, the system including first and second nodes, each node being programmed to periodically detect the nodes located in the surroundings thereof every time period ?, characterized in that: the first node comprises a transmitter (1) and control means (3) for activating the transmitter (1) for a transmission time ? less than the time period ?, the transmitter transmitting an identification signal during the transmission time ?; the second node comprises a receiver (2) and control means (3) for activating the receiver (2) for a reception time ? less than the time period ?, the receiver (2) listening for the signals from the adjacent nodes during the reception time a, the control means (3) of the second node activating the receiver once per time period ?.Type: GrantFiled: October 28, 2011Date of Patent: April 21, 2015Assignees: Institut National des Sciences Appliquees de Lyon, Institut National de Recherche en Informatique et en Automatique, Ecole Normale Superieure de Lyon, Universite Claude Bernard Lyon I, Centre National de la Recherche Scientifique (CNRS)Inventors: Antoine Fraboulet, Eric Fleury, Guillaume Chelius
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Publication number: 20140140920Abstract: A vanadium-based hydrogen permeation alloy for a membrane, a method of manufacturing the same, and a method of using a membrane including the same are provided. The vanadium-based hydrogen permeation alloy for a membrane includes nickel (Ni) at more than 0 atm % and 5 atm % or less, iron (Fe) at 5 atm % to 15 atm %, yttrium (Y) at more than 0 atm % and 1 atm % or less, and a remainder of vanadium and impurities.Type: ApplicationFiled: November 19, 2013Publication date: May 22, 2014Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Jin-Yoo SUH, Ja-ryeong KIM, Eric FLEURY, Young-Su LEE, In-Suk CHOI, Young-Whan CHO, Dong-Ik KIM, Jae-Hyeok SHIM
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Publication number: 20130333814Abstract: A Ti-based bulk amorphous matrix composite including a composition represented by Formula 1, in at %: TiaZrbBecCudNieMfIg??Formula 1 where M is at least one of Nb and Ta, I is an impurity, and a, b, c, d, e, and f vary within the ranges 38?a?50, 11?b?18, 12?c?20, 6?d?10, 6?e?9, 1?f?20 and 0.01?g?0.5, with a+b+c+d+e+f+g=100.Type: ApplicationFiled: June 19, 2012Publication date: December 19, 2013Inventors: Eric FLEURY, Jin-Yoo SUH, Yu-Chan KIM, Mukta Rani DEBNATH, Min-Hyun KIM, Tristan GEILLER
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Publication number: 20130286897Abstract: The invention relates to a system for determining surroundings in a wireless network, the system including first and second nodes, each node being programmed to periodically detect the nodes located in the surroundings thereof every time period ?, characterized in that: the first node comprises a transmitter (1) and control means (3) for activating the transmitter (1) for a transmission time ? less than the time period ?, the transmitter transmitting an identification signal during the transmission time ?; the second node comprises a receiver (2) and control means (3) for activating the receiver (2) for a reception time ? less than the time period ?, the receiver (2) listening for the signals from the adjacent nodes during the reception time a, the control means (3) of the second node activating the receiver once per time period ?.Type: ApplicationFiled: October 28, 2011Publication date: October 31, 2013Applicants: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), UNIVERSITE CLAUDE BERNARD LYON 1Inventors: Antoine Fraboulet, Eric Fleury, Guillaume Chelius
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Publication number: 20130049145Abstract: A radiation detector comprising a metal-carbon junction wherein a layer of carbon (11) is deposited on a layer of metal (12) having a work function higher than the work function of carbon (11), the junction having electrical characteristic of a diode.Type: ApplicationFiled: August 30, 2011Publication date: February 28, 2013Applicant: Instytut Fizyki Jadrowej im. Henryka Niewodniczanskiego PANInventors: Jacek Andrzej JAWORSKI, Eric Fleury, Malgorzata Kac, Marzena Mitura-Nowak, Zaneta Swiatkowska-Warkocka
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Publication number: 20120024431Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Ni100-a-b-c-d-e-fNbaZrbTicTadMeIf, wherein the M is at least one selected from a group of Sn and Si, wherein the I is at least one selected from a group of C and O, and wherein the a, b, c, d, e, and f are satisfied with the compositions of 10.0 wt %?a?25.0 wt %, 5.0 wt %?b?25.0 wt %, 5.0 wt %?c?10.0 wt %, 0.0 wt %?d?25.0 wt %, 0.0 wt %?e?6.5 wt %, 0.0 wt %?f?0.5 wt %, respectively.Type: ApplicationFiled: October 6, 2011Publication date: February 2, 2012Applicant: Korea Institute of Science and TechnologyInventors: Eric FLEURY, Jayaraj Jayamani, Ki-bae Kim, Mee-soon Lee, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Do-hyang Kim
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Patent number: 8070891Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Feioo-a-b-c-d-e-f-gCraMobCcBaYeMflg. Here, the M is at least one selected from a group consisting of Al, Co, N1 and Ni, and the I is at least one selected from a group consisting of Mn, P, S, and O as impurities. The a, b, c, d, e, f, and g are satisfied with the compositions of 16.0 wt %?a<22.0 wt %, 15.0 wt %<b?27.0 wt %, 2.0 wt %?c<3.5 wt %, 1.0 wt %<d?1.5 wt %, 1.0 wt %<e?3.5 wt %, 0.25 wt %<f?3.0 wt %, and 0.01 wt %?g<0.5 wt %, respectively.Type: GrantFiled: December 30, 2005Date of Patent: December 6, 2011Assignee: Korea Institute of Science and TechnologyInventors: Eric Fleury, Jayaraj Jayamani, Ki-bae Kim, Mee-soon Lee, legal representative, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Dohyang Kim
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Patent number: 8034200Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti +Y+Al+Co+the impurities=100.0 at %.Type: GrantFiled: June 17, 2009Date of Patent: October 11, 2011Assignee: Korea Institute of Science and TechnologyInventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
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Publication number: 20100147422Abstract: The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Feioo-a-b-c-d-e-f-gCraMobCcBaYeMflg. Here, the M is at least one selected from a group consisting of Al, Co, N1 and Ni, and the I is at least one selected from a group consisting of Mn, P, S, and O as impurities. The a, b, c, d, e, f, and g are satisfied with the compositions of 16.0 wt %?a<22.0 wt %, 15.0 wt %<b?27.0 wt %, 2.0 wt %?c<3.5 wt %, 1.0 wt %<d?1.5 wt %, 1.0 wt %<e?3.5 wt %, 0.25 wt %<f?3.0 wt %, and 0.01 wt %?g<0.5 wt %, respectively.Type: ApplicationFiled: December 30, 2005Publication date: June 17, 2010Applicant: Korea Institute of Science and TechnologyInventors: Eric Fleury, Jayaraj Jayamani, Ki-bae Kim, Hyun-kwang Seok, Yu-chan Kim, Kwang-youn Kim, Do-hyang Kim
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Publication number: 20090250143Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.Type: ApplicationFiled: June 17, 2009Publication date: October 8, 2009Applicant: Korea Institute of Science and TechnologyInventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
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Patent number: 7591916Abstract: In Cu-based bulk amorphous matrix composite materials, comprising a Cu-based amorphous alloy containing high fusion point element(s) selected from a group of Ta, W or combination thereof, wherein the high fusion point element(s) has(have) a shape of crystalline grain and is(are) dispersed around a Cu-based amorphous matrix. Cu-based bulk amorphous matrix composite materials have the composition expressed as the following Chemical formula 1; CuaZrbTicRd??[Chemical formula 1] where R is Ta, W or combination thereof, a, b, c and d are atomic weight ratio, a+b+c+d equals 100, a, b, c, and d have the range of 45?a?65, 10?b?35, 5?c?30, and 5?d?10, respectively.Type: GrantFiled: April 2, 2007Date of Patent: September 22, 2009Assignee: Korea Institute of Science & TechnologyInventors: Yu Chan Kim, Jae Chul Lee, Do Hyang Kim, Eric Fleury
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Patent number: 7563332Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10.0 at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.Type: GrantFiled: November 22, 2006Date of Patent: July 21, 2009Assignee: Korea Institute of Science and TechnologyInventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
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Publication number: 20070267111Abstract: A nanometer-sized porous metallic glass and a method for manufacturing the same are provided. The porous metallic glass includes Ti (titanium) at 50.0 at % to 70.0 at %, Y (yttrium) at 0.5 at % to 10.0 at %, Al (aluminum) at 10.0 at % to 30.0 at %, Co (cobalt) at 10. at % to 30.0 at %, and impurities. Ti+Y+Al+Co+the impurities=100.0 at %.Type: ApplicationFiled: November 22, 2006Publication date: November 22, 2007Applicant: Korea Institute of Science and TechnologyInventors: Eric Fleury, Yu-Chan Kim, Ki-Bae Kim, Jayamani Jayaraj, Do-Hyang Kim, Byung-Joo Park
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Patent number: 7147727Abstract: The present invention relates to a Cu-based amorphous alloy composition having a chemical composition represented by the following general formula, by atomic %: Cu100-a-b-c-dZraAlb(M1)c(M2)d, where a, b, c and d satisfy the formulas of 36?a?49, 1?b?10, 0?c?10, and 0?d?5, respectively, and c and d are not zero at the same time, and M1, the 4th element added to a ternary alloy of Cu—Zr—Al, is one metal element selected from the group consisting of Nb, Ti, Be and Ag, and M2, the 5th element added to the ternary alloy of the Cu—Zr—Al, is one amphoteric element or non-metal element selected from the group consisting of Sn and Si.Type: GrantFiled: June 25, 2004Date of Patent: December 12, 2006Assignee: Korea Institute of Science and TechnologyInventors: Yu Chan Kim, Eric Fleury, Ki Bae Kim, Hyun Kwang Seok
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Publication number: 20050211340Abstract: The present invention relates to a Cu-based amorphous alloy composition having a chemical composition represented by the following general formula, by atomic %: Cu100-a-b-c-dZraAlb(M1)c(M2)d, where a, b, c and d satisfy the formulas of 36?a?49, 1?b?10, 0?c?10, and 0?d?5, respectively, and c and d are not zero at the same time, and M1, the 4th element added to a ternary alloy of Cu—Zr—Al, is one metal element selected from the group consisting of Nb, Ti, Be and Ag, and M2, the 5th element added to the ternary alloy of the Cu—Zr—Al, is one amphoteric element or non-metal element selected from the group consisting of Sn and Si.Type: ApplicationFiled: June 25, 2004Publication date: September 29, 2005Applicant: Korea Institute of Science and TechnologyInventors: Yu Chan Kim, Eric Fleury, Ki Bae Kim, Hyun Kwang Seok