Abstract: A protective lens attachment is configured to couple to a camera lens ring to protect a camera lens during operation. The protective lens attachment can include a compressible structure, on which a force is exerted by a camera lens ring when the camera lens ring is inserted into the protective lens attachment. The compressible structure is configured to exert a reciprocal force onto the camera lens ring, creating a friction force between the compressible structure and the camera lens ring, and securely coupling the protective lens attachment to the camera lens ring.

Abstract: A protective lens attachment is configured to couple to a camera lens ring to protect a camera lens during operation. The protective lens attachment can include a compressible structure, on which a force is exerted by a camera lens ring when the camera lens ring is inserted into the protective lens attachment. The compressible structure is configured to exert a reciprocal force onto the camera lens ring, creating a friction force between the compressible structure and the camera lens ring, and securely coupling the protective lens attachment to the camera lens ring.

Abstract: A field-installable multi-fiber ferrule has two portions and one portion has optical fibers already secured therein. The second portion receives optical fibers to mate with the secured optical fibers. A tool is provided to assist in inserting the optical fibers into the multi-fiber ferrule by aligning and holding the optical fibers while they are secured in the multi-fiber ferrule.

Abstract: A field-installable multi-fiber ferrule has two portions and one portion has optical fibers already secured therein. The second portion receives optical fibers to mate with the secured optical fibers. A tool is provided to assist in inserting the optical fibers into the multi-fiber ferrule by aligning and holding the optical fibers while they are secured in the multi-fiber ferrule.

Abstract: A field-installable multi-fiber ferrule has two portions and one portion has optical fibers already secured therein. The second portion receives optical fibers to mate with the secured optical fibers. A tool is provided to assist in inserting the optical fibers into the multi-fiber ferrule by aligning and holding the optical fibers while they are secured in the multi-fiber ferrule.

Abstract: A field-installable multi-fiber ferrule has two portions and one portion has optical fibers already secured therein. The second portion receives optical fibers to mate with the secured optical fibers. A tool is provided to assist in inserting the optical fibers into the multi-fiber ferrule by aligning and holding the optical fibers while they are secured in the multi-fiber ferrule.

Abstract: In order to obviate the problem wherein localized lens aberration causes a pattern of low yield which cannot be corrected by conventional stepper correction/adjustment and which leads to the determination that the stepper lens is the source of the problem, the reticle is modified to produce an error which is selected to cancel the error that is being produced by the lens aberration and thus enable desired critical dimensions to produce on all dice. The modified reticle is then dedicated to the particular stepper.

Abstract: Critical dimension variation of photolithographically formed features on a semiconductor substrate is reduced by measuring the reflectivity of a photoresist layer and an underlying layer, such as a polysilicon layer, and adjusting the exposure level of the photoresist in accordance with the measured reflectivity. This allows precise control of feature width on the photoresist, which in turn allows precision etching of the underlying layer to accurately form a feature, such as a gate electrode.

Abstract: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

Abstract: An air bubble purging system for filters include a venturi valve in the drain line of the filter. The venturi valve is connected to a high pressure source line so that when a high rate of flow is produced in the high pressure source line, a venturi effect is created in the venturi valve to open the venturi valve and produce a vacuum in the drain line so that air bubbles are attracted into the drain line and purged.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Abstract: An adjustment error in a photolithographic stepping printer is detected by applying photoresist to a semiconductor wafer, and exposing the wafer to substantially identical light images in multiple locations using a stepping printer. The light images are defined by an optical reticle and include a plurality of lines or other features that are spaced from each other at approximately the resolution limit of the printer. Developer (16) is applied to the wafer to produce visible images corresponding to the light images. The visible images function as diffraction gratings which reflect light from the wafer. The visible images are inspected optoelectronically or manually. An adjustment error is determined to exist if the visible images appear substantially identical but are uneven or otherwise abnormal.

Abstract: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.

Abstract: A malfunction in a photolithographic fabrication track is detected by applying photoresist to a semiconductor wafer, and exposing the wafer to substantially identical light images in multiple locations using a stepping printer. The light images are defined by an optical reticle and include a plurality of lines or other features that are spaced from each other at approximately the resolution limit of the printer. Developer is applied to the wafer to produce visible images corresponding to the light images. The visible images function as diffraction gratings which reflect light from the wafer. The visible images are inspected optoelectronically or manually. A malfunction is determined to exist if the visible images are not substantially identical.