Abstract: An apparatus and method for achieving desired spectral emission characteristics in plasma lamps is disclosed. The apparatus and method use multi-layer thin film optical interference coatings to selectively reflect a portion of the light such that it can be absorbed in the plasma. The multi-layer thin film coating is applied to any surface of the lamp, which substantially surrounds the plasma. The number and thickness of the layers in the coating are selected to ensure that significant portion of the selected light emitted from the plasma is reflected by the coating and absorbed by the plasma. The properties of the coating, reflectance, transmittance and absorption are determined as a function of plasma and lamp characteristics.

Abstract: An apparatus and method for achieving desired spectral emission characteristics in plasma lamps is disclosed. The apparatus and method use multi-layer thin film optical interference coatings to selectively reflect a portion of the light such that it can be absorbed in the plasma. The multi-layer thin film coating is applied to any surface of the lamp, which substantially surrounds the plasma. The number and thickness of the layers in the coating are selected to ensure that significant portion of the selected light emitted from the plasma is reflected by the coating and absorbed by the plasma. The properties of the coating, reflectance, transmittance and absorption are determined as a function of plasma and lamp characteristics.

Abstract: The present invention is directed at least in part to methods and apparatus for optically monitoring selected optical characteristics of coatings formed on substrates during the deposition process and controlling the deposition process responsive thereto. In one aspect, the system includes a retroreflector for reflecting an electromagnetic beam transmitted by the coating and substrate back through the substrate and coating before selected properties of the retroreflected beam are measured. The system and method improve the signal to noise properties of the measured beam. The present invention may be used in systems for coating one or an array of substrates, and is particularly suitable for deposition processes where the substrates are translated past the sources of material to be deposited, and wherein the angle of incidence of a monitor beam on the substrate changes as the substrate translates past the beam source.

Abstract: An apparatus and method for achieving desired spectral emission characteristics in plasma lamps is disclosed. The apparatus and method use multi-layer thin film optical interference coatings to selectively reflect a portion of the light such that it can be absorbed in the plasma. The multi-layer thin film coating is applied to any surface of the lamp, which substantially surrounds the plasma. The number and thickness of the layers in the coating are selected to ensure that a significant portion of the selected light emitted from the plasma is reflected by the coating and absorbed by the plasma. The properties of the coating, reflectance, transmittance and absorption are determined as a function of plasma and lamp characteristics.

Abstract: An optical coating formed by alternating high index and low index layers having one or more thin crystal growth inhibiting layers for inhibiting crystal growth in the high index material or the low index material. The crystal growth inhibiting layers are formed from a material different than the material in the adjacent layers of the coating. The material may be the same as or different from the high index material or low index material. According to one aspect of the invention, the ratio of the indices of refraction of the high index material to the low index material may be increased by the use of materials such as rutile titanium dioxide as the high index material while reducing the scatter by limiting the size of crystals in the material.

Abstract: An apparatus and process for forming thin films of titanium dioxide in the rutile phase by reactive sputter deposition. In one aspect, a sputtering target and auxiliary plasma generator are positioned in a coating station in a sputtering chamber so that the titanium deposited on a substrate passing through the coating chamber is oxidized by exposure to the auxiliary plasma generated by the plasma generator commingled with the sputter plasma. The plasma may include monatomic oxygen to assist in the formation of rutile titanium dioxide. The target, or a pair of targets may also be operated from pulsed d.c. or a.c. power supplies.