Patents by Inventor Eric Lou

Eric Lou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography method including a double exposure/double bake
    Patent number: 6881524
    Abstract: A photoresist exposure process is disclosed which produces features which are substantially smaller than the aperture dimension of the mask used to make the feature. The smaller feature size results from a double exposure of the photoresist, combined with a double baking process to create the features in the photoresist. The double baking process thins the layer of photoresist, prior to the second exposure, thereby improving the resolution of the mark created by the second exposure on the photoresist. The process also uses a binary bias mask through which the first exposure is made, which overlaps with the area of the second exposure, to allow a process tolerance for the realignment of the mask over the wafer for the second exposure.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: April 19, 2005
    Assignee: ProMOS Technologies, Inc.
    Inventors: John Cauchi, Eric Lou
  • Photolithography method including a double exposure/double bake
    Publication number: 20040101790
    Abstract: A photoresist exposure process is disclosed which produces features which are substantially smaller than the aperture dimension of the mask used to make the feature. The smaller feature size results from a double exposure of the photoresist, combined with a double baking process to create the features in the photoresist. The double baking process thins the layer of photoresist, prior to the second exposure, thereby improving the resolution of the mark created by the second exposure on the photoresist. The process also uses a binary bias mask through which the first exposure is made, which overlaps with the area of the second exposure, to allow a process tolerance for the realignment of the mask over the wafer for the second exposure.
    Type: Application
    Filed: November 27, 2002
    Publication date: May 27, 2004
    Inventors: John Cauchi, Eric Lou