Abstract: A hearing protection system including a detection subsystem configured to determine bone conducted sound vibrations and one or more actuators placed proximate a predetermined location on the skull of a user configured to generate cancellation vibrations out of phase with the bone conducted sound vibrations to mitigate the effect of bone conducted sound vibrations on the middle and/or inner ear of a user.

Abstract: A hearing protection system including a detection subsystem configured to determine bone conducted sound vibrations and one or more actuators placed proximate a predetermined location on the skull of a user configured to generate cancellation vibrations out of phase with the bone conducted sound vibrations to mitigate the effect of bone conducted sound vibrations on the middle and/or inner ear of a user.

Abstract: A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the range from 5 nm to 12 nm, includes a multilayer system with respective layers of at least two alternating materials having differing real parts of the refractive index at the operating wavelength. The material having the lower real part of the refractive index is a nitride or a carbide. “Alternatively, the material having the lower real part of the refractive index is thorium, uranium or barium and the material having the higher real part of the refractive index is boron or boron carbide.

Abstract: A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium. Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).

Abstract: A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium. Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).

Abstract: The invention relates to a stand-alone video recording, playback and Monitoring system. It has network switches, non-volatile storage devices, IP cameras, video servers, and NTSC cameras. The system uses communication channels that are WAN/LAN based and can be hard-wired or wireless and has a flexibly implemented watchdog to detect, for example, hardware and power failure as well as other failures in the system.

Abstract: The invention relates to a stand-alone video recording, playback and Monitoring system. It has network switches, non-volatile storage devices, IP cameras, video servers, and NTSC cameras. The system uses communication channels that are WAN/LAN based and can be hard-wired or wireless and has a flexibly implemented watchdog to detect, for example, hardware and power failure as well as other failures in the system.

Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.

Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.

Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.

Abstract: A method of correcting a lockup error condition of a device includes a watchdog apparatus receiving an indication of activity from the device. The method also includes making a determination, from the indication of activity, whether the device is in a lockup condition. The method also includes interrupting power to the device with the watchdog apparatus if the determination is that the device is in the lockup condition. The watchdog apparatus includes a power input port for receiving power from a power source, a power output port for providing power to the device, and an activity port for receiving an indication of activity from the device. The watchdog apparatus makes a determination, from the indication of activity, whether the device is in a lockup condition, and interrupts the power provided to the device if the determination is that the device is in the lockup condition.

Abstract: A process for the production of optical broad band elements for the ultra violet to hard x-ray wavelength range, especially the extreme ultra violet wavelength range is described. A set from series of layers made of at least two materials in relation to the layer sequence is designed and numerical optimization of the the layer thicknesses and of the cap layer thickness is performed. The materials are chosen in such a way that two successive layers interact with each other as little as possible or controllably. The set can be formed from MO2C— and Si-layers. The numerical optimization takes into account interlayers of a certain thickness and composition.

Abstract: In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.

Abstract: The invention relates to a process for manufacturing multilayer systems for mirrors in the extreme ultraviolet and x-ray wavelength range, whereby at least one layer, in particular made of Mo, Si, Ru, C., B, Rb, Sr, Y, Cr, Sc or components thereof, is at least partly deposited with ion-beam assistance. In order to improve the surface properties of multilayer systems and to achieve the highest possible reflectivity the ion energy of the ion-beam is selected as an energy equivalent to or below the layer's sputtering threshold.

Abstract: Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

Abstract: A multilayer system and its production. Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. Their reflectivity can be enhanced by barrier layers. The multilayer systems according to the invention have protective layers comprising iridium. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the respective layer. The multilayer systems according to the invention are not only resistant to contamination and oxidation, but can also be cleaned if necessary, without losing reflectivity.

Abstract: When coating substrates it is frequently desired that the layer thickness should be a certain function of the position on the substrate to be coated. To control the layer thickness a mask is conventionally arranged between the coating particle source and the substrate. This leads to undesirable shadow effects. In addition, is has so far only been possible to obtain rotationally symmetrical thickness distributions. It is now proposed that masks should be used having apertures aligned according to a regular grid on the mask surface. Such a mask with a mask holder comprising a base frame (2), an intermediate frame (3) and a mask frame (4) which are joined one to the other by means of double hinges (5a, a′, b, b′), is moved arbitrarily in the mask plane. By this means arbitrary thickness distributions can be achieved when coating substrates at reasonable cost.

Abstract: Multilayer systems, such as those used as mirrors in the extreme ultraviolet wavelength range, suffer contamination or oxidation during storage in air and in long-time operation, i.e. when exposed to EUV radiation in a vacuum environment with certain partial pressures of water or oxygen, which causes a serious reduction in reflectivity. The multilayer system according to the invention will have a long life with constantly high reflectivity. The multilayer systems according to the invention have protective layers made from ruthenium, aluminium oxide, silicon carbide, molybdenum carbide, carbon, titanium nitride or titanium dioxide. The multilayer systems according to the invention are produced by direct, ion-beam-supported growth of the protective layer or, except in the case of ruthenium, by mixing aluminium or titanium with oxygen or nitrogen at atomic level, with ion-beam support, to product an outermost protective layer with ion-beam support.