Patents by Inventor Eric Louis Verpalen

Eric Louis Verpalen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, contaminant trap, and device manufacturing method
    Publication number: 20070023706
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Application
    Filed: July 6, 2005
    Publication date: February 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leonid Sjmaenok, Vadim Banine, Josephus Smits, Lambertus Van De Wildenberg, Alexander Schmidt, Arnoud Wassink, Eric Louis Verpalen, Antonius Van De Pas