Abstract: An improved method of forming the buried plate regions in deep trench capacitors used in DRAM memory semiconductor circuits in which the polymer used in the deep trench is etched down to the desired depth in a reactive ion etch tool using an O2/CF4 chemistry. Since optical/interferometric etch end-point detection system can be used to monitor the etch back step in its totality, the quantity of the polymer remaining in deep trenches can be very accurately controlled, which in turn will produce a well controlled buried plate region during the out-diffusion step of the arsenic dopant contained in the arsenic doped silicon glass layer.

Abstract: In wafer semiconductor manufacture, a method of etching an arsenic doped polysilicon layer down to a patterned boro-phospho-silicate-glass (BPSG) layer provided with a plurality of openings with an uniform etch rate is disclosed. The method relies on a combination of both system and process improvements. The system improvement consists to hold the wafer in the reactor during the etch process with an electrostatic chuck device to have a perfect plasma environment around and above the wafer. On the other hand, the process improvement consists in the use of a non dopant sensitive and not selective chemistry. A NF3/CHF3/N2 gas mixture with a 11/8.6/80.4 ratio in percent is adequate in that respect. The etch time duration is very accurately controlled by an optical etch endpoint detection system adapted to detect the intensity signal transition of a CO line at the BPSG layer exposure. The process is continued by a slight overetching.